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pro vyhledávání: '"Katsuya Shitanaka"'
Publikováno v:
JOURNAL OF CHEMICAL ENGINEERING OF JAPAN. 41:779-784
Titanium oxide (TiO2) thin films were grown on Si(100) substrates using the chemical vapor deposition (CVD) of titanium tetra isopropoxide (TTIP; Ti(OCH(CH3)2)4). The distribution of the growth rate in the reactor and the step coverage of films grown
Autor:
Katsuya Shitanaka, Young Sik Shin, Michihide Yoshida, Yasunobu Akiyama, Hiroshi Murakami, Nobuyuki Imaishi
Publikováno v:
Thin Solid Films. 515:4975-4979
Lithium niobate films grown epitaxially on sapphire substrate were prepared using a thermal chemical vapor deposition method from the metalorganic compounds Li(C 11 H 19 O 2 ) and Nb(OC 2 H 5 ) 5 . The range of operating conditions for obtaining pure