Zobrazeno 1 - 10
of 32
pro vyhledávání: '"Katsushi Nakano"'
Autor:
N. Sagawa, Y. Iriuchijima, T. Hayashi, T. Sei, T. Takahiro, K. Nakamura, T. Fujiwara, Kenichi Shiraishi, Hamid R. Khorram, Katsushi Nakano
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 25:63-71
From the initial stages of immersion lithography development, through mainstream manufacturing today, topcoat processes have been utilized. However, the complexity and extra cost associated with the topcoat layer has motivated the industry as a whole
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e12e49c8e7637f0847aa241d59e5febe
https://doi.org/10.1109/tsm.2011.2176760
https://doi.org/10.1109/tsm.2011.2176760
Publikováno v:
Journal of Groundwater Hydrology. 49:17-32
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0539374d990b55e7f201a3e4ce82b46
https://doi.org/10.5917/jagh1987.49.17
https://doi.org/10.5917/jagh1987.49.17
Autor:
Katsushi Nakano
Publikováno v:
Review of Scientific Instruments. 71:137-141
For the requirement to move a probe with respect to a large specimen like a silicon wafer, a three-dimensional beam tracking for optical lever force detection in atomic force microscopy has been developed. This beam tracking is not an approximate sol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a77c102b1ae818811936bdd199994812
https://doi.org/10.1063/1.1150175
https://doi.org/10.1063/1.1150175
Autor:
Katsushi Nakano
Publikováno v:
Review of Scientific Instruments. 69:1406-1409
A novel low profile atomic force microscope (AFM) compatible with conventional optical microscopes has been developed. This AFM can be fitted with two types of scanners for varying applications. For small area scanning, three stacked lead zirconite t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c38af26405b8f27a860061a5e224990
https://doi.org/10.1063/1.1148774
https://doi.org/10.1063/1.1148774
Publikováno v:
Journal of Nuclear Fuel Cycle and Environment. 4:59-71
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d395fa655180d3fa14dc7dde69ceced7
https://doi.org/10.3327/jnuce.4.59
https://doi.org/10.3327/jnuce.4.59
Publikováno v:
SPIE Proceedings.
Immersion scanner performance is being improved generation by generation. Faster scan speed is required to increase scanner productivity. There are, however, several papers reporting defect increase with higher scan speed 1, 2, 3 . To overcome this c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5716220f50720559d66a362274187b0
https://doi.org/10.1117/12.916271
https://doi.org/10.1117/12.916271
Autor:
Toshiyuki Sekito, Yasuhiro Iriuchijima, Katsushi Nakano, Soichi Owa, Rei Seki, Toshihiko Sei, Yoshihiro Maruta, Tsunehito Hayashi, Tomoharu Fujiwara, Kenichi Shiraishi, Tadamasa Kawakubo
Publikováno v:
SPIE Proceedings.
Double patterning (DP) is the first candidate for extension of ArF immersion lithography, and topcoat-less (TC-less) process is an attractive process candidate compared to a topcoat process because it can make DP process simpler and reduce the chip m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6110aecfaa49b34d2e530e425b6e7a75
https://doi.org/10.1117/12.846520
https://doi.org/10.1117/12.846520
Publikováno v:
Journal of the Japan Society of Engineering Geology. 32:321-332
For the sake of establishment of a hydrogeological model, the relationships among geological, geophysical and hydraulic properties were discussed, by the use of the data obtained from the rock formation at the Tono area.Performances of hydraulic test
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9667254ed45d968f427b44928155c45e
https://doi.org/10.5110/jjseg.32.321
https://doi.org/10.5110/jjseg.32.321
Publikováno v:
SPIE Proceedings.
In immersion lithography, importance is placed on technology for controlling coating along the edge of the wafer. In the case of a top-coat process, it has been observed that the top coat can peel off during immersion exposure due to weak adhesion to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c26e7857d5a601dd3c57a1d72237f0c
https://doi.org/10.1117/12.814112
https://doi.org/10.1117/12.814112
Autor:
Katsushi Nakano, Masato Yoshida, Yasuhiro Iriuchijima, Tomoharu Fujiwara, Rei Seki, Toshiyuki Sekito, Soichi Owa
Publikováno v:
SPIE Proceedings.
Volume device manufacturing using immersion lithography is widely accepted as the solution for patterning IC features below 40 nm half pitch. In order to ensure high yield and steady productivity tight control of defectivity is essential. A major sou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a690e0843ff897168b4958727bbea06c
https://doi.org/10.1117/12.814238
https://doi.org/10.1117/12.814238