Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Katsunori Tsunoda"'
Autor:
Tadahiro Ishii, Hiroyuki Kaidou, Katsunori Tsunoda, Asahiro Ahagon, Hirofumi Yajima, Makoto Kawakubo
Publikováno v:
Rubber Chemistry and Technology. 78:659-673
Effect of stretching on oxidative crosslinking of a carbon black filled IR vulcanizate at a normal temperature was studied by means of ESR and crosslink density measurements. Upon deformation, ESR intensity increased and crosslink density decreased,
Publikováno v:
The Review of Laser Engineering. 31:98-102
The ArF excimer laser ablates the cornea and other tissue with micrometer-size precision and minimal residual thermal damage. However, there is still no clear picture regarding the mechanisms for the excimer laser ablation (ELA) giving rise to this f
Autor:
Katsunori Tsunoda, Daisuke Kumaki, Hirofumi Yajima, Teruo Takahashi, Hiroshi Itoh, Tadahiro Ishii
Publikováno v:
Applied Surface Science. :782-785
The materials ejected from the hydrated collagen gel by ArF laser (193 nm) ablation were investigated using time-resolved photography, atomic force microscopy (AFM), and FTIR attenuated total reflectance spectroscopy (FTIR-ATR). The time-resolved pho
Autor:
Jiro Taniyama, Masaru Sugiura, Katsunori Tsunoda, Tadahiro Ishii, Masashi Sonoyama, Hirofumi Yajima, Hiroshi Itoh
Publikováno v:
Journal of Photochemistry and Photobiology A: Chemistry. 145:195-200
In order to gain an obvious insight into the role of water in the mechanism of the excimer laser ablation of the cornea, we have macroscopically investigated the ablation behavior of collagen gel in the swelled state by direct photoetching using an A
Autor:
Tetsumi Watanabe, Takeyoshi Nakayama, Kazuyuki Okada, Takaomi Matsutani, Kensuke Murai, Y Maezono, H Yanagita, K Nishi, J Miyano, null Yokotani, K Kurosawa, W Sasaki, N Hishinumac, H Matsuno, H Yuasa, M Okoshi, N Inoue, Y Watanabe, M Kuramatsu, Y KAWAKAMI, E OZAWA, Minoru UEHARA, Toshiyuki ITO, Shouzaburo TOYODA, Yukio IWASAKI, Kunio HARA, Hidehiko MIYAO, Masahiro Tsukamoto, Manabu Tanaka, Nobuyuki Abe, Kazuhiro Nakata, Masao Ushio, Choijil Baasandash, Jun MAEHARA, Masamiti NAKAGAWA, Takashi YABE, Masashi Iwamoto, Hajime Ebisutani, Noriyo Sakurada, Yoshio Ishii, Kazuhiro Watanabe, Yuzuru Kubota, K. Tokumura, T. Jitsuno, M. Nakatsuka, S. Motokoshi, H. Tamamura, N. Aoki, K. Sugioka, K. Obata, T. Akane, T. Takahashi, S. H. Cho, H. Kumagai, K. Toyoda, K. Midorikawa, M. Mizumachi, K. Suzuki, M. Toda, M. Murahara, E. Fujiwara, T. Hino, M. Yatsuzuka, K. Yoshida, A. Nishiguchi, Toshihiko Ooie, Mayumi Tode, Yasuo Takagawa, K. Takahashi, T. Yoneyama, M. Osawa, Katsunori Tsunoda, Daisuke Kumaki, Hirofumi Yajima, Tadahiro Ishii, Haruo Kawai, S. Ohta, H. Nagata, H. Yoneda, K. Ueda, Richard More, Toshihara Makino, Yuka Yamada, Nobuyasu Suzuki, Takahito Yoshida, Seinosuke Onari, Yoshiki Nakata, Tatsuo Okada, Mitsuo Maeda, Tomomasa Ohkubo, Masahiro Kuwata, Boris Luktyanchuk, T. Otubo, J. Mune, Y. Katuta, S. Kubodera, Hiroyuki Niino, Tadatake Sato, Akiko Narazaki, Akira Yabe, T. Tsuchiya, A. Watanabe, Y. Imai, I. Yamaguchi, T. Manaba, T. Kumagai, S. Mizuta, Tomoyuki Shimoda, Kosuke Takahashi, Minoru Obara, I. Nagata, S. Jogan, M. Enomoto, Masaru Kawarazaki, K. Kawahara, Hiroyuki Furukawa, Masaki Hashida, Yoichi Hirayama, Kazue Ozono, S. Koito, K. Shihoyama, M. Kawachi, S. Souma, Manabu Taniwaki, Fumio Kokai, Akiko Goto, Yoshinori Koga, A. Masagaki, M. Miyazawa, Sadao Higuchi, Kiyotaka Ueda, Y. Ishida, S. Fukaya, Y. Ogawa, H. Ohmuro, Y. Sato, H. Tokunaga, M. Yamanaka, Kouki Shimizu, Katsuaki Ohashi, Kiyoshi Kurosawa, Takashi Katagiri, Yuji Matsuura, Mitsunobu Miyagi, Takashi Yamamoto, Goro Takada, M. YODA, N. MUKAI, T. UEHARA, Y. SANO, N. SUEZONO, K. HIROTA, K. MIYAZATO, Fabien Barnier
Publikováno v:
The Review of Laser Engineering. 29:99-101,104
Autor:
Manabu Taniwaki, Fumio Kokai, Yoshinori Koga, Y. Wakayama, M. Murahara, Y. Matsuda, T. Takahama, A. Kameyama, A. Yokotani, K. Kurosawa, Tetumi Watanabe, Takeyosi Nakayama, Takaomi Matutani, Kazuyuki Okada, M. Suzuki, K. Fukuchi, H. Iiduka, J. Yang, Yoshiki Nakata, Tatsuo Okada, Mitsuo Maeda, M. Tomita, T. Ikegame, M. Toda, T. Jituno, M. Yamanaka, H. Fukutomi, Y. Yasojima, Tatsuya Shinozaki, Toshihiko Ooie, Tetsuo Yano, Masahumi Yoneda, Yoshihisa Uchida, Jun Yamada, Yoshiyuki Uchida, Junichi Muramoto, Takahiro Inmaru, K. Makino, K. Toyoda, Hiroyuki Niino, Tadatake Sato, Akira Yabe, Katsunori Tsunoda, Hirofumi Yajima, Tadahiro Ishii, Toshihiko Yamauchi, Eisuke Minehara, Nobuhiro Kikuzawa, Gakuto Hayakawa, Suguru Sawamura, Ryouji Nagai, Nobuyuki Nishimori, Ryouichi Hajima, Toshiyuki Shizuma, Yasutaka Kamei, Hisato Ikai, Shinichi Itoh, Yukio Furukawa, S. Oda, T. Sakai, A. Masagaki, Sung-Hak Cho, Hiroshi Kumagai, Katsumi Midorikawa, Minoru Obara, Yuji KAWAKAMI, Takafumi SETO, Yoshihiro YAMAUCHI, Eiichi OZAWA, K. Takahashi, M. Yudasaka, S. Iijima, Takeshi TSUJI, Kenzo IRYO, Hidefumi OHTA, Yukio NISHIMURA, Takashi FUSHIMI, Hiromasa NAKAJIMA, Masaki MORIKAWA, Hideyuki HORISAWA, Shigeru YAMAGUCHI, Nobuo YASUNAGA, Tomoo FUJIOKA, Hajime Ebisutanii, Noriyo Sakurada, Yoshio Ishi, Kazuhiro Watanabe, Yuzuru Kubota, Gaku Kuwahara, Masanori Ootani, Masato Tetsuka, Sachio Seto, Mikiya Arai, Kenzo Nanri, T. TANAKA, S. IHARA, M. ISHIMINE, S. SATOH, C. YAMABE, M. Mizumachi, K. Suzuki, J. Nakata, Y. Kawamura, M. Terashima, N. Inoue, S. Kashiwabara, R. Fujimoto, H. Yuasa, S. Masutani, Y. Kasamo, F. Yahiro, H. Uetuhara, K. Ueda, S. Higuchi, Y. Kubo, Y. Kodaira, Y. Yamaguchi, Y. Minami, Masaru Sugiura, Hiroshi Ito, T. Ohtubo, K. Iwao, S. Kubodera, W. Sasaki, Y. Suzuki, M. Isii
Publikováno v:
The Review of Laser Engineering. 28:89-97,103
Publikováno v:
Journal of Photopolymer Science and Technology. 12:85-88
Autor:
Hiroko Okuyama, Motoki Watanabe, Mamoru Okutomi, Masanao Tani, Takeyo Tsukamoto, Takeyoshi Nakayama, Yuki Kondo, Masaru Sugirua, S. Oyama, Y. Kawasaki, Satoshi Ihara, N. Morirnoto, A. Yokotani, M. Tomita, Quan Li, S. Kubodera, H. Takakusaki, Yoshihisa Uchida, Toshio Goto, Tatuya Kyotani, Jianrong Qiu, H. Yanagita, Keiu Tokumura, Masataka Murahara, Katsunori Tsunoda, Jun Yamada, Hirotaka Nakayama, Nobuyuki Takahashi, Akira Obara, Noriaki Nishi, Nobuo Ando, Nobuo Isii, T. Hashidume, S. Yosihara, Zhengxin Liu, K. Sugioka, Takashi Inoue, K. Miura, Shigeru Yamaguchi, Tetsuya Hattori, H. Matsuno, T. Ikagame, Kouji Higashikawa, Xiaoyang Zeng, Takeshi Sasaki, Jun Kamiiisaka, H. Sano, Hideo Furuhashi, Y. Kawakami, Mineo Hiramatu, Tetukazu Tanaka, Hirofumi Yajima, T. Kawashima, A. Masagaki, Takashi Obara, Sadao Fujii, T. Mori, Takuya Takasaki, Y. Mase, Kozo Yasuda, Yoshiyuki Uchida, M. Ishii, Takenari Mori, Y. Shinto, K. Kadota, Kunimitsu Takahashi, Hiromi Kawase, Takahisa Jitsuno, Masayuki Okoshi, J. Kawanaka, Naoto Koshizaki, Hitoki Yoneda, N.B. Dahotre, H. Ashizawa, Kenichi Ueda, Shigeto Kobayashi, Tomoo Fujioka, Akinori Kaji, T. Hirayama, Nobuo Yasunaga, K. Makino, Masafumi Ito, Akihiro Kono, R. Nomura, Hikaru Kouta, Hideyuki Horisawa, Chobei Yamabe, Kazuyuki Akagawa, Shinji Motokoshi, Tadahiro Ishii, Kazuyuki Hirao, Naoshige Hayashi, J. Nakata, N. Takezoe, S. Ito, Hiroyuki Niino, Mitsugu Hanabusa, J. Morimoto, Keiji Fuse, Yukinori Hato, Sachiko Umeda, Satoru Nishio, Koichi Toyoda, Naokatsu Yamamoto, Y. Minami, T. Kubota, Yukio Nakajima, Hiroyasu Sato, Masaru Hori, H. Takai, Nobuhiro Akasaka, Hiroshi Ito, E. Ozawa, Takeshi Okada, Kazuyoshi Tanaka, W. Sasaki, Mikio Muro, K. Midorikawa, Tsuguru Shirakawa, M. Hasegawa, T. Suzuki, Saburoh Satoii, Masahiro Nakatsuka, Masayuki Nakamura, T. Igarashi, Shigenori Kuriki, Keiji Ebata, Tadatake Sato, Shinnosuke Nozaki, Manabu Shiozaki, K. Suzuki, Kazushi Fujita, K. Hirobe, T. Mitsuyu, H. Iizuka, Hironari Mikata, Koichi Tsukamoto, K. Obata, K. Kurosawa, K. Kumagai, Masashi Ishimine, Takashi Fushimi, Shigeru Semura, T. Sato, Akira Yabe, Koichi Sasaki, Kazuyuki Okada, S. Nakjima, Y. Maezono, Akiyoshi Matsuzaki
Publikováno v:
The Review of Laser Engineering. 27:73-77,80
Publikováno v:
Journal of Photochemistry and Photobiology A: Chemistry. 106:21-26
Atomic force microscopy (AFM) was used to estimate the etching form on excimer laser ablation of polythiophene films. Electrochemically prepared polythiophene films were irradiated with ArF (193 nm) and KrF (248 nm) excimer lasers through a mask atta
Autor:
Hirofumi Yajima, Takahiro Otsuka, Yoshihiko Tezuka, Katsunori Tsunoda, Hiroshi Ito, Tadahiro Ishii
Publikováno v:
Journal of Photopolymer Science and Technology. 9:277-284
In order to know the applicability of excimer laser ablation to the microphotoetching of collagen films, they were irradiated by an ArF (193nm) and a KrF (248nm) excimer laser through a mask. Well-defined patterning of excellent quality was attained