Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Katsumi YONEDA"'
Autor:
Nobuyoshi Kobayashi, Katsumi Yoneda, Kaoru Sakota, Takahisa Ohno, Minoru Inoue, Tomoyuki Hamada, Nobuo Tajima, Kazuhiro Miyazawa, Yoshiaki Inaishi, Manabu Shinriki, Satoshi Hasaka, Seiichi Kondo
Publikováno v:
Japanese Journal of Applied Physics. 46:5970-5974
We have computationally explored the chemical structures of carbon-doped silicon oxide (SiOCH) films that give the smallest dielectric constant (k) under the required mechanical strength for low-k dielectrics. The focus of this study is on the SiOCH
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::653dfb1f12df7383f3da3ff236466c6e
https://doi.org/10.1143/jjap.46.5970
https://doi.org/10.1143/jjap.46.5970
Publikováno v:
Journal of Applied Physics. 90:5497-5503
A measurement technique of the absolute concentration of hydrogen (H) atoms in methane (CH4) and/or hydrogen molecule (H2) plasmas has been established. The H-atom concentration was evaluated by vacuum ultraviolet absorption spectroscopy (VUVAS) usin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed089829c79ab4cf6e5aa694226e442c
https://doi.org/10.1063/1.1410327
https://doi.org/10.1063/1.1410327
Autor:
Masafumi Ito, Akihiro Kono, Katsumi Yoneda, Toshio Goto, Seigou Takashima, Masaru Hori, Shigeo Arai
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:599-602
We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N2) microdischarge hollow cathode lamp (N2 MHCL) as a light source of the atomic nitrogen (N) resonance lines for measuring
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a99a390807de9ef9223bdda9f7316e02
https://doi.org/10.1116/1.1340655
https://doi.org/10.1116/1.1340655
Autor:
Manabu Kato, Katsumi Yoneda, Tomoyuki Hamada, Seiichi Kondo, Jiro Ushio, Takahisa Ohno, Nobuyoshi Kobayashi, Shin-ichi Nakao, Yoshiaki Kamigaki
Publikováno v:
Japanese Journal of Applied Physics. 46:3351-3353
On the basis of electron spin resonance (ESR) measurements, we observed a unique paramagnetic center (Tb center, g=2.003) in porous low-dielectric-constant (low-k) carbon-doped silicon oxide (SiOCH) film after annealing the film in vacuum. Fourier tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::410f4b70ac1b57bd69a873870035ad96
https://doi.org/10.1143/jjap.46.3351
https://doi.org/10.1143/jjap.46.3351
Autor:
Jiro Ushio, Shin-ichi Nakao, Katsumi Yoneda, Nobuyoshi Kobayashi, Takahisa Ohno, Tomoyuki Hamada, Manabu Kato
Publikováno v:
Japanese Journal of Applied Physics. 46:L405-L407
Utilizing the structure of porous SiOC determined in our previous study, we investigated a mechanism for improving the properties of porous SiOC film by ultraviolet irradiation (UV curing). The generation of a Si–O–Si cross link from an OH group
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f1837bf85e166b803a2ced37684e6a9
https://doi.org/10.1143/jjap.46.l405
https://doi.org/10.1143/jjap.46.l405
Autor:
Masa-aki Kakimoto, Katsumi Yoneda, Akira Tanaka, Toshihiro Suwa, Mitsutoshi Jikei, Yoshio Imai
Publikováno v:
Thin Solid Films. 273:258-262
Plasma polymerization using a direct current (d.c.) glow discharge was carried out using several organic compounds. We have developed a plasma-polymerization instrument capable of using not only gaseous monomers but also liquids and solids as the sta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d0050d4dde9bd8448a97f0e85b12a2f
https://doi.org/10.1016/0040-6090(95)07000-1
https://doi.org/10.1016/0040-6090(95)07000-1
Publikováno v:
The Review of Laser Engineering. 21:661-665
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c02202c5c3a0ecc9458251a98a18f7be
https://doi.org/10.2184/lsj.21.6_661
https://doi.org/10.2184/lsj.21.6_661
Publikováno v:
Applied Physics Letters. 75:3929-3931
We have developed a measurement technique for absolute H-atom densities in process plasmas using vacuum ultraviolet absorption spectroscopy employing a high-pressure microdischarge hollow-cathode lamp (MHCL) as a Lyman α (Lα, 121.6 nm) emission lig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::631d022c791e80f61a6dc797bc1a0ab6
https://doi.org/10.1063/1.125497
https://doi.org/10.1063/1.125497
Autor:
Katsumi Yoneda
Publikováno v:
Sen'i Gakkaishi. 46:P340-P347
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::943d6817d0ea664c34346ed50e1422ea
https://doi.org/10.2115/fiber.46.8_p340
https://doi.org/10.2115/fiber.46.8_p340
Autor:
Shin-Ichi Nakao, Nobuyoshi Kobayashi, Takahisa Ohno, Tomoyuki Hamada, Katsumi Yoneda, Jiro Ushio, Manabu Kato
Publikováno v:
MRS Proceedings. 914
We determined the most probable atomistic structure of an ultra-low-k material (k≅ 2.5) by computer simulations. Among the candidate structures generated by a molecular-dynamics calculation, the most probable one that reproduces the observed proper
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d6044a56c0204263c9a1f2efb382a50b
https://doi.org/10.1557/proc-0914-f03-02
https://doi.org/10.1557/proc-0914-f03-02