Zobrazeno 1 - 10
of 49
pro vyhledávání: '"Katsumi Sugisaki"'
Autor:
Mikihiko Ishii, Yutaka Watanabe, Katsuhiko Murakami, Takayuki Hasegawa, Shinichi Hara, Yucong Zhu, Kazuya Ota, Jun Kawakami, Tetsuya Oshino, Masanobu Hasegawa, Akiyoshi Suzuki, Osamu Kakuchi, Jun Saito, Yoshiyuki Sekine, Hiroyuki Kondo, Katsumi Sugisaki, Chidane Ouchi, Seiji Takeuchi
Publikováno v:
Japanese Journal of Applied Physics. 42:5844-5847
We present a type of lateral shearing interferometer (LSI) for at-wavelength characterization of the projection lens for use in extreme-ultraviolet lithography (EUVL). LSI is one of the potential candidates for high Numerical Aperture (NA) optics tes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb36bb0bbc9ee0f30bc238357d477dd6
https://doi.org/10.1143/jjap.42.5844
https://doi.org/10.1143/jjap.42.5844
Publikováno v:
Microelectronic Engineering. :1077-1082
At-wavelength phase-shifting point diffraction interferometer (PDI) is a technique to measure wavefront error of EUV lithography optics. While they use radiation from undulators in medium size electron storage rings with further wavelength purificati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0f518bd321388341fa7fe5ab91f8aef
https://doi.org/10.1016/s0167-9317(02)00495-1
https://doi.org/10.1016/s0167-9317(02)00495-1
Autor:
Yoshinori Ichikawa, Seima Kato, Chidane Ouchi, Katsuhiko Murakami, Naoki Kohara, Tokuyuki Honda, Katsumi Sugisaki, Yucong Zhu, Katsura Otaki, Masanobu Hasegawa, Mitsuo Takeda
Publikováno v:
Fringe 2013 ISBN: 9783642363580
Extreme ultraviolet (EUV, λ=13.5 nm) lithography is expected as the next generation lithography to the ArF immersion lithograph (λ =193 nm ). Projection optics is composed of several aspheric mirrors and its aberration should be about 1/30λ rms (0
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8428d011a7f04f7f13399d87760e2477
https://doi.org/10.1007/978-3-642-36359-7_70
https://doi.org/10.1007/978-3-642-36359-7_70
Publikováno v:
Langmuir. 16:7796-7800
The effect of local curvature of a sample surface on capillary and interface tension adhesion forces of the water meniscus formed between the AFM tip and sample in air is demonstrated both theoretically and experimentally. We propose an analytical so
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::959f0e7ab68133eba6d9b9ed64c83bbc
https://doi.org/10.1021/la000392n
https://doi.org/10.1021/la000392n
Autor:
Ei Yano, Tetsuya Oshio, Shigeo Irie, Katsumi Sugisaki, Hiroaki Oizumi, Shinji Okazaki, Nobuyuki Matsuzawa, Atsushi Miyafuji, Shigeyasu Mori, Hiroo Kinoshita, Shigeru Shirayone, Takeo Watanabe
Publikováno v:
Microelectronic Engineering. 53:689-692
This paper predicts the resolution of EUV lithography by using wet and dry developable resist process. We demonstrated that there is a possibility of the wet-develop type single layer resist whose type is positive-tone or negative-tone CA resist. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0fbcd149692228890c994b6e5df91b08
https://doi.org/10.1016/s0167-9317(00)00406-8
https://doi.org/10.1016/s0167-9317(00)00406-8
Publikováno v:
Langmuir. 15:5093-5097
We applied force curve mapping to chromosomes. Two types of artifacts were observed in the adhesion force images thus obtained. Location shifting between the adhesion and topographic images and deformation of the measured adhesive structure were seen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c073c680a221bfff4489b190027186d1
https://doi.org/10.1021/la980746z
https://doi.org/10.1021/la980746z
Autor:
Katsumi Sugisaki, Nobuyuki Nakagiri
Publikováno v:
Applied Surface Science. :613-617
Force curve mapping is expected to become a useful technique for material analysis. In order to analyze the huge amount of force curve data involved in such mapping, we have developed specialized data processing software. This software can extract th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7eb58bc91d7a6af62aaa362af46a9a2
https://doi.org/10.1016/s0169-4332(98)00876-9
https://doi.org/10.1016/s0169-4332(98)00876-9
Autor:
Masashi Okada, Yucong Zhu, Jun Kawakami, Tokuyuki Honda, Masanobu Hasegawa, Takayuki Hasegawa, Katsura Otaki, Chidane Ouchi, Masahito Niibe, Katsuhiko Murakami, Katsumi Sugisaki, Hideo Yokota, Seima Kato
Publikováno v:
SPIE Proceedings.
The wavefront measurements have been performed with the EUV Wavefront Metrology System (EWMS) for the first time using a prototype projection optic as a test optic. The wavefronts of the test optic was measured at the five positions in the exposure f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b14f915993ef9db830481b21b2dee95
https://doi.org/10.1117/12.772624
https://doi.org/10.1117/12.772624
Autor:
Chidane Ouchi, Masashi Okada, Masahito Niibe, Katsumi Sugisaki, Takayuki Hasegawa, Seima Kato
Publikováno v:
AIP Conference Proceedings.
Precise measurement of the wavefront errors of projection optics with 0.1 nm RMS accuracy is necessary to develop extreme ultraviolet (EUV) lithography. To accomplish this, an experimental EUV interferometer was developed and installed at the NewSUBA
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e2a8bb0f5439c79b68d250c0d0f32e61
https://doi.org/10.1063/1.2436354
https://doi.org/10.1063/1.2436354
Autor:
Masanobu Hasegawa, Katsumi Sugisaki, Hideo Yokota, Seima Kato, Katsuhiko Murakami, Masahito Niibe, Chidane Ouchi, Jun Saito, Masashi Okada, Takayuki Hasegawa, Mitsuo Takeda
Publikováno v:
SPIE Proceedings.
Precise measurements of the wavefront aberrations of projection optics with 0.1 nm RMS accuracy are indispensable to develop the extreme ultraviolet (EUV) lithography. In order to study measurement methods, we built the Experimental EUV Interferomete
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48950228e6da094808d0675dc14a3989
https://doi.org/10.1117/12.656039
https://doi.org/10.1117/12.656039