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pro vyhledávání: '"Katsumi Omori"'
Autor:
Kiyoshi Ishikawa, Mitsuru Sato, Katsumi Omori, Anthony E. Novembre, Toshimasa Nakayama, Leonidas E. Ocola
Publikováno v:
SPIE Proceedings.
High acceleration voltage electron beam exposure is one of the possible candidates for post-optical lithography. The use of electrons, instead of photons, avoids optical related problems such as the standing wave issues. However, resists must conform
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2037dbc3b7288770c89eddc179d29cef
https://doi.org/10.1117/12.351094
https://doi.org/10.1117/12.351094
