Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Katsumi Kishimoto"'
Publikováno v:
Japanese Journal of Health Physics. 49:180-189
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9dd89c3f8e71a754cd38e93c1cfcb5a5
https://doi.org/10.5453/jhps.49.180
https://doi.org/10.5453/jhps.49.180
Autor:
Yusuke Matsunaga, Katsuya Okumura, Tetsuya Hasebe, Makoto Sugihara, Yukihiro Kawano, Hiroaki Hayashi, Taiga Takata, Ryoichi Inanami, Kenta Nakamura, Katsumi Kishimoto, Kazuaki Murakami
Publikováno v:
IEICE Transactions on Electronics. :377-383
We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projecti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::777c5f05ddeda548701bc4ea3509392c
https://doi.org/10.1093/ietele/e89-c.3.377
https://doi.org/10.1093/ietele/e89-c.3.377
Autor:
Yoshiaki Ishikawa, Yoshihiro Nagumo, Yoshihisa Kaneko, Kazuhiko Ohsawa, Kouichi Ito, Katsumi Kishimoto
Publikováno v:
The Proceedings of the Symposium on Environmental Engineering. :123-125
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3f271adad34dff380521ecbf6e38927
https://doi.org/10.1299/jsmeenv.2013.23.123
https://doi.org/10.1299/jsmeenv.2013.23.123
Autor:
Katsumi Kishimoto, Ryo Yamada
Publikováno v:
IEEJ Transactions on Industry Applications. 124:24-30
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d21b13315b22adf572d6e32baf3260a2
https://doi.org/10.1541/ieejias.124.24
https://doi.org/10.1541/ieejias.124.24
Autor:
Katsumi Kishimoto, Kazuaki Murakami, Yusuke Matsunaga, Katsuya Okumura, Tetsuya Hasebe, Rx. Inanami, H. Hayashi, Taiga Takata, Yukihiro Kawano, Makoto Sugihara, R. Inanami, Kenta Nakamura
Publikováno v:
ISCAS
We propose a character size optimization technique to enhance the throughput of maskless lithography as well as photomask manufacture. The number of electron beam shots to draw the patterns of circuits is a dominant factor in the manufacture time and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3745606817b05d1a5c4f79622748274
https://doi.org/10.1109/iscas.2006.1693146
https://doi.org/10.1109/iscas.2006.1693146
Autor:
Ryo Yamada, Kiyoshi Kitamura, Kazuhiro Nakai, Shunko Magoshi, Ryoichi Inanami, Yoshikazu Ichioka, Katsumi Kishimoto
Publikováno v:
SPIE Proceedings.
The EBIS data conversion system has been developed to be optimized for layout data of logic devices with Character Projection (CP) method. In the system, standard cells and memory cells are registered into a character database as keeping the hierarch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c35519bbd88fbdad215326d85621d52b
https://doi.org/10.1117/12.655438
https://doi.org/10.1117/12.655438
Autor:
Yusuke Matsunaga, Katsumi Kishimoto, Katsuya Okumura, Kazuaki Murakami, Makoto Sugihara, Yukihiro Kawano, Kenta Nakamura, Taiga Takata, Tetsuya Hasebe, Ryoichi Inanami, Hiroaki Hayashi
Publikováno v:
SPIE Proceedings.
The character projection is utilized for maskless lithography and is a potential for the future photomask manufacture. The drawback of the character projection is its low throughput and leads to a price rise of ICs. This paper discusses a technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b96008d6f6aeacc4502c33fa7b1c6c3
https://doi.org/10.1117/12.656153
https://doi.org/10.1117/12.656153
Autor:
H. Hayashi, Yukihiro Kawano, Makoto Sugihara, Kenta Nakamura, Taiga Takata, Katsumi Kishimoto, Kazuaki Murakami, Yusuke Matsunaga, Katsuya Okumura, Ryoichi Inanami, Tetsuya Hasebe
Publikováno v:
SoC
We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (integer linear programming)-based cell selection is proposed for EBDW systems in which both of the character pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5a75654eb37f8b371a3aaaf1cc60bab
https://doi.org/10.1109/issoc.2005.1595663
https://doi.org/10.1109/issoc.2005.1595663
Publikováno v:
Multimedia Modeling.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e832fd892948739ce52d74814eb9c85a
https://doi.org/10.1142/9789812791993_0002
https://doi.org/10.1142/9789812791993_0002
Publikováno v:
Multimedia Modeling - Modeling Multimedia Information & Systems (Mmm 2000); 2000, p19-31, 13p