Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Katsumi Kishimoto"'
Publikováno v:
Japanese Journal of Health Physics. 49:180-189
Autor:
Yusuke Matsunaga, Katsuya Okumura, Tetsuya Hasebe, Makoto Sugihara, Yukihiro Kawano, Hiroaki Hayashi, Taiga Takata, Ryoichi Inanami, Kenta Nakamura, Katsumi Kishimoto, Kazuaki Murakami
Publikováno v:
IEICE Transactions on Electronics. :377-383
We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projecti
Autor:
Yoshiaki Ishikawa, Yoshihiro Nagumo, Yoshihisa Kaneko, Kazuhiko Ohsawa, Kouichi Ito, Katsumi Kishimoto
Publikováno v:
The Proceedings of the Symposium on Environmental Engineering. :123-125
Autor:
Katsumi Kishimoto, Ryo Yamada
Publikováno v:
IEEJ Transactions on Industry Applications. 124:24-30
Publikováno v:
Multimedia Modeling - Modeling Multimedia Information & Systems (Mmm 2000); 2000, p19-31, 13p
Autor:
Katsumi Kishimoto, Kazuaki Murakami, Yusuke Matsunaga, Katsuya Okumura, Tetsuya Hasebe, Rx. Inanami, H. Hayashi, Taiga Takata, Yukihiro Kawano, Makoto Sugihara, R. Inanami, Kenta Nakamura
Publikováno v:
ISCAS
We propose a character size optimization technique to enhance the throughput of maskless lithography as well as photomask manufacture. The number of electron beam shots to draw the patterns of circuits is a dominant factor in the manufacture time and
Autor:
Ryo Yamada, Kiyoshi Kitamura, Kazuhiro Nakai, Shunko Magoshi, Ryoichi Inanami, Yoshikazu Ichioka, Katsumi Kishimoto
Publikováno v:
SPIE Proceedings.
The EBIS data conversion system has been developed to be optimized for layout data of logic devices with Character Projection (CP) method. In the system, standard cells and memory cells are registered into a character database as keeping the hierarch
Autor:
Yusuke Matsunaga, Katsumi Kishimoto, Katsuya Okumura, Kazuaki Murakami, Makoto Sugihara, Yukihiro Kawano, Kenta Nakamura, Taiga Takata, Tetsuya Hasebe, Ryoichi Inanami, Hiroaki Hayashi
Publikováno v:
SPIE Proceedings.
The character projection is utilized for maskless lithography and is a potential for the future photomask manufacture. The drawback of the character projection is its low throughput and leads to a price rise of ICs. This paper discusses a technology
Autor:
H. Hayashi, Yukihiro Kawano, Makoto Sugihara, Kenta Nakamura, Taiga Takata, Katsumi Kishimoto, Kazuaki Murakami, Yusuke Matsunaga, Katsuya Okumura, Ryoichi Inanami, Tetsuya Hasebe
Publikováno v:
SoC
We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (integer linear programming)-based cell selection is proposed for EBDW systems in which both of the character pro
Publikováno v:
Multimedia Modeling.