Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Katie Lynn Nardi"'
Publikováno v:
ACS Applied Materials & Interfaces. 12:42226-42235
Monolayer and multilayer dodecanethiols (DDT) can be assembled onto a copper surface from the vapor phase depending on the initial oxidation state of the copper. The ability of the copper-bound dodecanethiolates to block atomic layer deposition (ALD)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f48be9d0c333b598f2beddeb4756074c
https://doi.org/10.1021/acsami.0c08873
https://doi.org/10.1021/acsami.0c08873
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 37(39)
To enable area-selective atomic layer deposition (AS-ALD), self-assembled monolayers (SAMs) have been used as the surface inhibitor to block a variety of ALD processes. The integrity of the SAM throughout the ALD process is critical to AS-ALD. Despit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8a84390b18873952611ce84ead7a5802
https://pubmed.ncbi.nlm.nih.gov/34550696
https://pubmed.ncbi.nlm.nih.gov/34550696
Publikováno v:
Chemistry of Materials. 31:1635-1645
Area-selective atomic layer deposition (AS-ALD) is a promising “bottom-up” alternative to current nanopatterning techniques. Self-assembled monolayers (SAM) have been successfully employed as deact...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1985c9dffa659f90842f9e1fe0b6d5e6
https://doi.org/10.1021/acs.chemmater.8b04926
https://doi.org/10.1021/acs.chemmater.8b04926
Autor:
Katie Lynn Nardi, Tzu-Ling Liu, David S. Bergsman, Stacey F. Bent, Richard G. Closser, Nerissa Draeger, Dennis M. Hausmann
Publikováno v:
Chemistry of Materials. 30:5694-5703
The vapor-phase reaction of dodecanethiol (DDT) with copper oxide surfaces and the molecular level composition and structure of the resulting films were examined. Atomic force microscopy, cross-sec...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b87d2173eca6b34288d455260dcdb319
https://doi.org/10.1021/acs.chemmater.8b02150
https://doi.org/10.1021/acs.chemmater.8b02150
Creating Highly Active Atomic Layer Deposited NiO Electrocatalysts for the Oxygen Evolution Reaction
Publikováno v:
Advanced Energy Materials. 5:1500412
Atomic layer deposition (ALD) provides a promising route for depositing uniform thin coatings of electrocatalysts useful in many technologies, including the splitting of water. For materials such as NiO x that readily form hydrous oxides, however, th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71b185df2f479f6896690448ddd18155
https://doi.org/10.1002/aenm.201500412
https://doi.org/10.1002/aenm.201500412