Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Kathleen A. Gehoski"'
Publikováno v:
International Symposium for Testing and Failure Analysis.
Practice and training samples have been manufactured using 3D-printing methods. These 3D-printed samples mimic the exact geometry of focused ion beam (FIB) prepared specimens and can be used to help master ex situ and in situ lift out micromanipulati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d6481d1036185b8f73f7db72ad1fe4b
https://doi.org/10.31399/asm.cp.istfa2019p0236
https://doi.org/10.31399/asm.cp.istfa2019p0236
Publikováno v:
Microscopy and Microanalysis. 25:912-913
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e745402c4b23cf9af0a99b4356f4acd0
https://doi.org/10.1017/s1431927619005294
https://doi.org/10.1017/s1431927619005294
Autor:
Laura Dues, Jeffrey H. Baker, D. J. Resnick, William J. Dauksher, Kathleen A. Gehoski, Ngoc V. Le
Publikováno v:
SPIE Proceedings.
Along with other Next Generation Lithography (NGL) methods, imprint lithography has been included on the International Roadmap for Semiconductors (ITRS) for the 32 nm node, predicted to be production-ready by 20131. Step and Flash Imprint Lithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ba8da0a3d23e891a2df8ad9289382ba
https://doi.org/10.1117/12.605932
https://doi.org/10.1117/12.605932
Autor:
William J. Dauksher, Harald F. Hess, Kevin J. Nordquist, Douglas J. Resnick, Mark Raphaelian, Mark A. McCord, Kathleen A. Gehoski, Eric S. Ainley
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (S-FIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes S-FIL has the advantage that the template is transparent, thereby facilitating conventional overlay techniqu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c81582db924276565104982831cfb70
https://doi.org/10.1117/12.606102
https://doi.org/10.1117/12.606102
Autor:
David P. Mancini, Douglas J. Resnick, Ngoc V. Le, Kevin J. Nordquist, S. R. Young, William J. Dauksher, Kathleen A. Gehoski
Publikováno v:
SPIE Proceedings.
Recently, the International Roadmap for Semiconductors (ITRS) has included imprint lithography on its roadmap, to be ready for production use in 2013 at the 32 nm node. Step and Flash Imprint Lithography (S-FIL TM ) is one of the promising new method
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74e3d3dd4ea7365571bb832acc0f1510
https://doi.org/10.1117/12.537382
https://doi.org/10.1117/12.537382
Autor:
William J. Dauksher, Kevin J. Nordquist, Sean D. Burns, C. Grant Willson, Yi Wei, Kathleen A. Gehoski, Ryan L. Burns, Douglas J. Resnick, David P. Mancini, Nicholas A. Stacey, Eui K. Kim, Diana Convey, Gerard M. Schmid, Jason E. Meiring, Michael D. Dickey, Stephen C. Johnson, Peter Fejes
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is a revolutionary next generation lithography option that has become increasingly attractive in recent years. Elimination of the costly optics of current step and scan imaging tools makes SFIL a serious cand
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::33b86a1c504507f27c505d74d2622bf6
https://doi.org/10.1117/12.536216
https://doi.org/10.1117/12.536216
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (S-FIL) is one of several new methods of imprint lithography being actively developed. As with other nanoimprint methods, S-FIL resolution appears to be limited only by template resolution, and offers a significant
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3be8309e40bee025ad47fceea3794529
https://doi.org/10.1117/12.537380
https://doi.org/10.1117/12.537380
Autor:
William J. Dauksher, Kevin J. Nordquist, David P. Mancini, Kathleen A. Gehoski, Douglas J. Resnick, Ian M. Mcmackin, Philip D. Schumaker
Publikováno v:
SPIE Proceedings.
Step and FLash Imprint Lithography (S-FIL) is one of several new methods of imprint lithography being actively developed. Since S-FIL is a 1X printing technique, fabrication of templates is especially critical. The requirement to produce defect-free
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::625f7bd52a6a3d18b8cf2dc12dea0054
https://doi.org/10.1117/12.518307
https://doi.org/10.1117/12.518307
Autor:
Philip D. Schumaker, Ian M. Mcmackin, David P. Mancini, Douglas J. Resnick, Kevin J. Nordquist, Kathleen A. Gehoski, William J. Dauksher
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is one of several new nano-imprint techniques being actively developed. While SFIL has been shown to be capable of sub-30 nm resolution, critical dimension (CD) control of imprinted features must be demonstra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::edc46c5ee0f782c25f6353d0ee0c8d65
https://doi.org/10.1117/12.484923
https://doi.org/10.1117/12.484923
Autor:
David P. Mancini, Eric S. Ainley, Douglas J. Resnick, Kathleen A. Gehoski, William J. Dauksher, Pawitter J. S. Mangat, Zorian S. Masnyj, Kevin J. Nordquist
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint Lithography (SFIL) is an attractive low-cost method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent thereby facilitating conventional overlay t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::998b83e4e29f5909d59f9ce13f1793e4
https://doi.org/10.1117/12.467753
https://doi.org/10.1117/12.467753