Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Kasica, R. J."'
Autor:
Baylor, L. R., Gardner, W. L., Yang, X., Kasica, R. J., Guillorn, M. A., Blalock, B., Cui, H., Hensley, D. K., Islam, S., Lowndes, D. H., Melechko, A. V., Merkulov, V. I., Joy, D. C., Rack, P. D., Simpson, M. L., Thomas, D. K.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 6, p3021-3024, 4p
Autor:
Ocola, L. E., Farrow, R. C., Kasica, R. J., Caminos, C. G., Rutberg, L., Fullowan, R. F., Teffeau, K., Blakey, M. I., Peabody, M. L., Knurek, C. S., Bogart, G. R., Novembre, A. E., Liddle, J. A., Lercel, M., Magg, C., Collins, K., Trybendis, M., Cadwell, N., Jeffer, R., Dauksher, W. J.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 6, p2659-2664, 6p
Autor:
Ocola, L. E., Li, W. Y., Kasica, R. J., Blakey, M. I., Orphanos, P. A., Waskiewicz, W. K., Novembre, A. E., Sato, M.
Publikováno v:
Microelectronic Engineering; 2000, Vol. 53 Issue: 1 p433-436, 4p
Autor:
Kalaiselvi SMP; Singapore Synchrotron Light Source (SSLS), National University of Singapore (NUS), 5 Research Link, Singapore, 117603, Singapore. slssmpk@nus.edu.sg., Tang EX; Institute of Materials Research and Engineering, 2 Fusionopolis Way, Singapore, 138634, Singapore., Moser HO; Attonics Systems Pte Ltd, 10 Anson Road, International Plaza, Singapore, 079903, Singapore.; Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology (IMT), Postfach 3640, 76021, Karlsruhe, Germany., Breese MBH; Singapore Synchrotron Light Source (SSLS), National University of Singapore (NUS), 5 Research Link, Singapore, 117603, Singapore., Turaga SP; Attonics Systems Pte Ltd, 10 Anson Road, International Plaza, Singapore, 079903, Singapore., Kasi H; Attonics Systems Pte Ltd, 10 Anson Road, International Plaza, Singapore, 079903, Singapore., Heussler SP; Attonics Systems Pte Ltd, 10 Anson Road, International Plaza, Singapore, 079903, Singapore.
Publikováno v:
Scientific reports [Sci Rep] 2022 Feb 17; Vol. 12 (1), pp. 2730. Date of Electronic Publication: 2022 Feb 17.
Publikováno v:
2006 19th International Vacuum Nanoelectronics Conference; 2006, p561-576, 16p
Autor:
Christopher H. Ray, Ian Gilbert, Kartik Srinivasan, David A. Czaplewski, Brian A. Bryce, Krishna C. Balram, Christopher B. Wallin, Meredith Metzler, Slava Krylov, Karen E. Grutter, Leonidas E. Ocola, Vladimir A. Aksyuk, Juraj Topolancik, Thomas Michels, Richard Kasica, Neal A. Bertrand, J. Alexander Liddle, Nicolae Lobontiu, Liya Yu, Marcelo Davanco, Gregory Simelgor, Yuxiang Liu, Gerald G. Lopez, Daron A. Westly, Samuel M. Stavis, Vojtech Svatos, Kristen A. Dill, B. Robert Ilic, Qing Li, Pavel Neuzil
Publikováno v:
J Res Natl Inst Stand Technol
Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024
Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Stan
Autor:
Häßler-Grohne, W., Bosse, H.
Publikováno v:
Measurement Science & Technology; Jul1998, Vol. 9 Issue 7, p1-1, 1p