Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Karthik Pillai"'
Autor:
Karthik Pillai, Alex Chong, Sundar Raj Thangavelu, Yusuke Mori, Wee Shing Koh, Sivanand Somasundaram, Hirosi Kojima, Huizhe Liu
Publikováno v:
Energy and Buildings. 223:110190
With the increase in the stock of old buildings in urban cities, there is an imperative demand to retrofit the old buildings to reduce their energy consumption and also maximize the use of natural daylight to enhance the well-being of the occupants i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da7bfe5ded7fd85318ff495499e89f68
https://doi.org/10.1016/j.enbuild.2020.110190
https://doi.org/10.1016/j.enbuild.2020.110190
Autor:
Elliott Franke, Akiteru Ko, Peter Biolsi, Eric Liu, David L. O'Meara, Karthik Pillai, Nihar Mohanty
Publikováno v:
SPIE Proceedings.
Dimension shrinkage has been a major driving force in the development of integrated circuit processing over a number of decades. The Self-Aligned Quadruple Patterning (SAQP) technique is widely adapted for sub-10nm node in order to achieve the desire
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ffc60979ac9ffb8abc74f328d9bfff0
https://doi.org/10.1117/12.2258097
https://doi.org/10.1117/12.2258097
Autor:
Angelique Raley, Akiteru Ko, Sophie Thibaut, Cheryl Pereira, Subhadeep Kal, Nihar Mohanty, Aelan Mosden, Karthik Pillai, Richard A. Farrell, Peter Biolsi, Elliott Franke
Publikováno v:
Advanced Etch Technology for Nanopatterning VI.
Scaling beyond the 7nm technology node demands significant control over the variability down to a few angstroms, in order to achieve reasonable yield. For example, to meet the current scaling targets it is highly desirable to achieve sub 30nm pitch l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e193ef6db497cdfbbd237af9d6b038b
https://doi.org/10.1117/12.2257507
https://doi.org/10.1117/12.2257507