Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Karsten Gutjhar"'
Autor:
Christian Sparka, Brent Riggs, Karsten Gutjhar, Lipkong Yap, Bill Pierson, Miguel Garcia-Medina, Woong Jae Chung, Vidya Ramanathan, Onur N. Demirer, Ramkumar Karur-Shanmugam, Lokesh Subramany, John C. Robinson
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
With the introduction of Nix process nodes, leading-edge factories are facing challenging demands in shrinking design margins. Previously uncorrected high-order signatures, and uncompensated temporal changes of high-order signatures, carry an importa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bcd32ce811d3973d6a3b0026995ba299
https://doi.org/10.1109/asmc.2015.7164504
https://doi.org/10.1109/asmc.2015.7164504
Autor:
Lipkong Yap, Karsten Gutjhar, Lokesh Subramany, Chanseob Cho, Patrick Snow, Tal Itzkovich, Vidya Ramanathan
Publikováno v:
SPIE Proceedings.
WORDS) Persistently shrinking design rules and increasing process complexity require tight overlay control thereby making it imperative to choose the most suitable overlay measurement technique and complementary target design. In this paper we descri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8a8730974c344848e61ab337262fded
https://doi.org/10.1117/12.2086016
https://doi.org/10.1117/12.2086016
Autor:
Subramany, Lokesh, Chung, Woong Jae, Gutjhar, Karsten, Garcia-Medina, Miguel, Sparka, Christian, Yap, Lipkong, Demirer, Onur, Karur-Shanmugam, Ramkumar, Riggs, Brent, Ramanathan, Vidya, Robinson, John C., Pierson, Bill
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p324-328, 5p