Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Karsten Fleck"'
Autor:
Viktor Havel, Vikas Rana, Rainer Waser, Ulrich Böttger, Stephan Menzel, Karsten Fleck, Moritz von Witzleben
Publikováno v:
Scientific Reports
Scientific Reports, Vol 10, Iss 1, Pp 1-9 (2020)
Scientific reports 10, 16391 (2020). doi:10.1038/s41598-020-73254-2
Scientific reports 10(1), 16391 (2020). doi:10.1038/s41598-020-73254-2
Scientific Reports, Vol 10, Iss 1, Pp 1-9 (2020)
Scientific reports 10, 16391 (2020). doi:10.1038/s41598-020-73254-2
Scientific reports 10(1), 16391 (2020). doi:10.1038/s41598-020-73254-2
The increasing demand for high-density data storage leads to an increasing interest in novel memory concepts with high scalability and the opportunity of storing multiple bits in one cell. A promising candidate is the redox-based resistive switch rep
Publikováno v:
physica status solidi (a). 213:316-319
For any application of redox-based resistive switching devices understanding of variability is of major interest. In this work, we analyze the dependence of the SET switching time in pulse measurements of TiN/HfOx/Pt devices on the initial state befo
Publikováno v:
IEEE Transactions on Electron Devices. 62:1561-1567
The distribution of SET switching time of bipolar switching tantalum oxide thin films is studied using pulse measurement techniques. SET switching times are measured by repeating SET and RESET operations in a single cell. It is found that the distrib
Autor:
Ulrich Böttger, Karsten Fleck, Rainer Waser, Carsten Funck, M. von Witzleben, E. Wichmann, Thomas Breuer, Stephan Menzel
Publikováno v:
NVMTS
The physical principle of redox based resistive switching memory cells is based on ionic and electronic transport propertips. Both normally reveal a strong temperature dependence. A novel heating setup enables to study the influence of high temperatu
Autor:
Stephan Menzel, Camilla La Torre, Ulrich Böttger, Nabeel Aslam, Susanne Hoffmann-Eifert, Karsten Fleck
Publikováno v:
Physical review applied 6(6), 064015 (2016). doi:10.1103/PhysRevApplied.6.064015
Identifying limiting factors is crucial for a better understanding of the dynamics of the resistive switching phenomenon in transition-metal oxides. This improved understanding is important for the design of fast-switching, energy-efficient, and long
Autor:
Stephan Menzel, Karsten Fleck, Rainer Waser, Susanne Hoffmann-Eifert, Ulrich Böttger, Nabeel Aslam
Publikováno v:
ESSDERC
Resistive random access memories based on redox phenomena (ReRAM) combine several advantages. Beside their good scalability, high endurance and fast switching speed they are also very energy efficient. This work presents a study of the SET kinetics o
Autor:
Rainer Waser, Stephan Menzel, Bernd Rösgen, Ulrich Böttger, Viktor Havel, Vikas Rana, Karsten Fleck
Publikováno v:
2016 IEEE Silicon Nanoelectronics Workshop (SNW).
To understand the switching mechanism in resistive switching memories it is important to study the switching kinetics over several orders in time. One open question is the upper limit of the switching speed. In this study, we present a switching kine
Autor:
Ulrich Böttger, Nabeel Aslam, Fred Roozeboom, Susanne Hoffmann-Eifert, V Valentino Longo, Wilhelmus M. M. Kessels, Karsten Fleck, Stephan Menzel, Rainer Waser
Publikováno v:
Journal of applied physics 120(24), 244502-(2016). doi:10.1063/1.4972833
Journal of applied physics, 120
Journal of Applied Physics, 120. American Institute of Physics
Journal of applied physics, 120
Journal of Applied Physics, 120. American Institute of Physics
Compared to conventional NAND flash resistive switching metal-oxide cells show a number of advantages, like an increased endurance, lower energy consumption, and superior switching speed. Understanding the role of defects for the resistive switching
Publikováno v:
IEEE Electron Device Letters. 35:924-926
In this letter, we present a study of the SET kinetics of bipolar switching SrTiO 3 -based resistive memory devices. Pulse measurements on a timescale from 1 μs to 1 s and voltage sweeps with sweep-rates up to 6 MV/s were performed showing a highly
Publikováno v:
IEEE Electron Device Letters. 35:259-261
In this letter, we discuss the kinetics of the resistive switch effect in tantalum oxide thin films. The time to switch from the high resistance state to the low resistance state (SET) was measured by using pulse measurement technique. It was found t