Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description

Autor: Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, Joerg Zimmermann, Paul Graeupner

Publikováno v: Journal of Micro/Nanopatterning, Materials, and Metrology. 21

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bc40cc94b06692dc846abdfb6f75fbf9
https://doi.org/10.1117/1.jmm.21.2.023801

EUV high-NA scanner and mask optimization for sub-8nm resolution

Autor: Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser

Publikováno v: Extreme Ultraviolet (EUV) Lithography VII.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::38dff91a04c134926bae557cf76ec298
https://doi.org/10.1117/12.2220150

High NA EUV enabling cost efficient scaling for N+1 technology nodes

Autor: Greet Storms, Sjoerd Lok, Rob van Ballegoij, Jan van Schoot, Rudy Peeters, Diederik de Bruin, Kars Troost, Teun van Gogh

Publikováno v: Optical and EUV Nanolithography XXXV
SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::03558a12fb1ca8b36da13436b61c7667