Zobrazeno 1 - 10
of 158
pro vyhledávání: '"Karol Fröhlich"'
Publikováno v:
Beilstein Journal of Nanotechnology, Vol 10, Iss 1, Pp 1443-1451 (2019)
Lithiated thin films are necessary for the fabrication of novel solid-state batteries, including the electrodes and solid electrolytes. Physical vapour deposition and chemical vapour deposition can be used to deposit lithiated films. However, the iss
Externí odkaz:
https://doaj.org/article/041a4c228627400e9e0ed6acca486a3b
Autor:
Gang Niu, Pauline Calka, Peng Huang, Sankaramangalam Ulhas Sharath, Stefan Petzold, Andrei Gloskovskii, Karol Fröhlich, Yudi Zhao, Jinfeng Kang, Markus Andreas Schubert, Florian Bärwolf, Wei Ren, Zuo-Guang Ye, Eduardo Perez, Christian Wenger, Lambert Alff, Thomas Schroeder
Publikováno v:
Materials Research Letters, Vol 7, Iss 3, Pp 117-123 (2019)
The HfO2-based resistive random access memory (RRAM) is one of the most promising candidates for non-volatile memory applications. The detection and examination of the dynamic behavior of oxygen ions/vacancies are crucial to deeply understand the mic
Externí odkaz:
https://doaj.org/article/bfa1280cf60d4b379358b352d3ab6ba9
Autor:
Kaupo Kukli, Marianna Kemell, Marko Vehkamäki, Mikko J. Heikkilä, Kenichiro Mizohata, Kristjan Kalam, Mikko Ritala, Markku Leskelä, Ivan Kundrata, Karol Fröhlich
Publikováno v:
AIP Advances, Vol 7, Iss 2, Pp 025001-025001-15 (2017)
Thin solid films consisting of ZrO2 and Ta2O5 were grown by atomic layer deposition at 300 °C. Ta2O5 films doped with ZrO2, TaZr2.75O8 ternary phase, or ZrO2 doped with Ta2O5 were grown to thickness and composition depending on the number and
Externí odkaz:
https://doaj.org/article/22b488fce4d14e6d84feaaec89ee973e
Autor:
Kristína Hušeková, Prangya Parimita Sahoo, Matej Mičušík, Karol Fröhlich, Martin Kemény, Ján Šoltýs, Ladislav Harmatha, Miroslav Mikolášek, Edmund Dobročka, Peter Ondrejka
Publikováno v:
ACS Applied Energy Materials. 4:11162-11172
Autor:
Ladislav Harmatha, Peter Ondrejka, Filip Chymo, Karol Fröhlich, Martin Kemény, Kristína Hušeková, Ivan Hotovy, Miroslav Mikolášek
Publikováno v:
Journal of Electrical Engineering. 72:203-207
This paper is dedicated to preparation and analysis of metal insulator semiconductor (MIS) photoanode with a metal organic chemical vapor deposited RuO2 layer and TiO2 protection layer for photoelectrochemical water splitting. It is shown that utiliz
Autor:
Magdaléna Kadlečíková, Ľubomír Vančo, Juraj Breza, Miroslav Mikolášek, Kristína Hušeková, Karol Fröhlich, Paul Procel, Miro Zeman, Olindo Isabella
Publikováno v:
Optik. 257
We compared the morphology and Raman response of nanoscale shaped surfaces of Si substrates versus monocrystalline Si. Samples were structured by reactive ion etching, and four of them were covered by a RuO2-IrO2 layer. Raman bands, centred at approx
Publikováno v:
Beilstein Journal of Nanotechnology, Vol 10, Iss 1, Pp 1443-1451 (2019)
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology
Lithiated thin films are necessary for the fabrication of novel solid-state batteries, including the electrodes and solid electrolytes. Physical vapour deposition and chemical vapour deposition can be used to deposit lithiated films. However, the iss
Autor:
Juraj Racko, Filip Chymo, M. Tapajna, Vlastimil Rehacek, Karol Fröhlich, Miroslav Mikolášek, Kristína Hušeková, Ladislav Harmatha
Publikováno v:
Applied Surface Science. 461:48-53
This paper presents an electrical and photoelectrochemical comparison of MIS photoanodes with a metal organic chemical vapor deposited RuO2 layer and evaporated Ni layer to provide a deeper insight into the interface properties of such structures. Th
Autor:
Karol Fröhlich, Dagmar Gregušová, Jan Kuzmik, M. Gregor, Stanislav Hasenöhrl, E. Brytavskyi, Š. Haščík, Roman Stoklas, M. Ťapajna
Publikováno v:
Applied Surface Science. 461:255-259
The impact of oxidation agent and post-metallization annealing (PMA) on the quality of oxide-semiconductor interface in AlGaN/GaN metal-oxide semiconductor heterostructure field-effect transistors (MOS-HFETs) with HfO2 grown by atomic layer depositio
Autor:
Ivan Kundrata, Maïssa K. S. Barr, Sarah Tymek, Dirk Döhler, Boris Hudec, Philipp Brüner, Gabriel Vanko, Marian Precner, Tadahiro Yokosawa, Erdmann Spiecker, Maksym Plakhotnyuk, Karol Fröhlich, Julien Bachmann
Publikováno v:
Small Methods. 6:2270028