Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Karla Bernal Ramos"'
Publikováno v:
Chemistry of Materials. 27:4943-4949
Atomic layer deposition of cobalt silicide (CoSi2) thin films on H-terminated Si(111) surfaces, using the cobalt-based precursor tertiarybutylallylcobalttricarbonyl (tBu-AllylCo(CO)3) and trisilane, is investigated by in situ Fourier transform infrar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e5dfa8ddeec661d9cf6789c9dc1d49b
https://doi.org/10.1021/acs.chemmater.5b00743
https://doi.org/10.1021/acs.chemmater.5b00743
Publikováno v:
Coordination Chemistry Reviews. 257:3271-3281
Deposition of thin films with desired compositions, conformality and bonding to substrates is a key component in nanotechnology research. The growth of metal films by atomic layer deposition (ALD) has become an important field of study due to its wid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::540a8a9c9390ad0835ba80f054c19654
https://doi.org/10.1016/j.ccr.2013.03.028
https://doi.org/10.1016/j.ccr.2013.03.028
Autor:
Karla Bernal Ramos, Nicola Pinna, Wilfredo Cabrera, Yves J. Chabal, Catherine Marichy, Guylhaine Clavel
Publikováno v:
Repositório Científico de Acesso Aberto de Portugal
Repositório Científico de Acesso Aberto de Portugal (RCAAP)
instacron:RCAAP
Repositório Científico de Acesso Aberto de Portugal (RCAAP)
instacron:RCAAP
The mechanisms of growth of TiO2 thin films by atomic layer deposition (ALD) using either acetic acid or ozone as the oxygen source and titanium isopropoxide as the metal source are investigated by in situ Fourier transform infrared spectroscopy (FTI
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1711d21ea867f38747fe90cd468a0ca8
https://doi.org/10.1021/cm400164a
https://doi.org/10.1021/cm400164a