Zobrazeno 1 - 10
of 85
pro vyhledávání: '"Karl-Heinz Heinig"'
Autor:
Xiaomo Xu, Thomas Prüfer, Daniel Wolf, Hans-Jürgen Engelmann, Lothar Bischoff, René Hübner, Karl-Heinz Heinig, Wolfhard Möller, Stefan Facsko, Johannes von Borany, Gregor Hlawacek
Publikováno v:
Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 2883-2892 (2018)
For future nanoelectronic devices – such as room-temperature single electron transistors – the site-controlled formation of single Si nanocrystals (NCs) is a crucial prerequisite. Here, we report an approach to fabricate single Si NCs via medium-
Externí odkaz:
https://doaj.org/article/5156d91379fe4eba94329c4846b8921b
Autor:
Nico Klingner, Karl-Heinz Heinig, David Tucholski, Wolfhard Möller, René Hübner, Lothar Bischoff, Gregor Hlawacek, Stefan Facsko
Publikováno v:
Journal of Physical Chemistry Letters 126(2022), 16332-16340
Enhanced interstitial diffusion in tin is a phenomenon often observed during ion-beam irradiation and in lead-free solders. For the latter, this not very well understood, strain-driven mechanism results in the growth of whiskers, which can lead to un
Autor:
P. Brianceau, M. Rommel, Hans-Jürgen Engelmann, M.-L. Pourteau, J. von Borany, F. Laulagnet, Guido Rademaker, J.-A. Dallery, Ahmed Gharbi, L. Baier, Karl-Heinz Heinig, Raluca Tiron
Publikováno v:
Micro and Nano Engineering
Micro and Nano Engineering, Elsevier, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering 9(2020), 100074
Micro and Nano Engineering, Vol 9, Iss, Pp 100074-(2020)
Micro and Nano Engineering, Elsevier, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering 9(2020), 100074
Micro and Nano Engineering, Vol 9, Iss, Pp 100074-(2020)
International audience; SETs (Single-Electron-Transistors) arouse growing interest for their very low energy consumption. For future industrialization, it is crucial to show a CMOS-compatible fabrication of SETs, and a key prerequisite is the pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ffaa0176ed92185b48dbaa77d24531d
https://hal-cea.archives-ouvertes.fr/cea-03409432
https://hal-cea.archives-ouvertes.fr/cea-03409432
Autor:
Wolfhard Möller, Johannes von Borany, Hans-Jürgen Engelmann, Xiaomo Xu, Gregor Hlawacek, Thomas Prüfer, Lothar Bischoff, Stefan Facsko, Karl-Heinz Heinig, Daniel Wolf, René Hübner
Publikováno v:
Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 2883-2892 (2018)
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology
For future nanoelectronic devices - such as room-temperature single electron transistors - the site-controlled formation of single Si nanocrystals (NCs) is a crucial prerequisite. Here, we report an approach to fabricate single Si NCs via medium-ener
Autor:
Grant V. M. Williams, Karl-Heinz Heinig, Prasanth Gupta, René Hübner, Andreas Markwitz, Hans Werner Becker
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 394:6-11
Hydrogenated diamond-like carbon films produced by C 3 H 6 deposition at 5 kV and implanted at room temperature with 30 keV Co atoms to 12 at.% show not only a bimodal distribution of Co atoms but also a massive redistribution of hydrogen in the film
Autor:
Wolfhard Möller, Hans-Jürgen Engelmann, Johannes von Borany, Daniel Wolf, Thomas Prüfer, Xiaomo Xu, Karl-Heinz Heinig
Publikováno v:
Journal of Applied Physics
A single sheet of Si nanoclusters with an average diameter of about 2 nm has been formed in a 30 nm Si/7 nm SiO2/Si layer stack by 50 and 60 keV Si+ ion-beam mixing at room temperature and fluences between 8.5 ⋅ 1015 and 2.6 ⋅ 1016 ions/cm2 and b
Autor:
Ahmed Gharbi, Karl-Heinz Heinig, Johannes von Borany, Hans-Jürgen Engelmann, Wolfhard Möller, Raluca Tiron, Nico Klingner, Gregor Hlawacek, Xiaomo Xu
Publikováno v:
Semiconductor Science and Technology 35(2020)1, 015021
Semiconductor Science and Technology
Semiconductor Science and Technology
Si nanopillars of less than 50 nm diameter have been irradiated in a helium ion microscope with a focused Ne+ beam. The morphological changes due to ion beam irradiation at room temperature and elevated temperatures have been studied with the transmi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::25a3fdcd6f35e7f7f2c07abc9820ec76
Autor:
Raluca Tiron, Hans-Jürgen Engelmann, L. Baier, Ahmed Gharbi, Guido Rademaker, Karl-Heinz Heinig, J.-A. Dallery, P. Brianceau, J. von Borany, M.-L. Pourteau, F. Laulagnet, M. Rommel
Publikováno v:
Microelectronic Engineering. :111336
This article has been withdrawn at the request of the author(s) and published in Micro and Nano Engineering. The Publisher apologizes for any inconvenience this may cause. The full Elsevier Policy on Article Withdrawal can be found at https://www.els
Autor:
Xin Ou, Karl-Heinz Heinig, Manfred Helm, Xi Wang, René Hübner, Stefan Facsko, Jörg Grenzer, Jürgen Fassbender
Publikováno v:
Nanoscale. 7:18928-18935
Semiconductor quantum dots and wires are important building blocks for future electronic and optoelectronic devices. The common way of producing semiconductor nanostructures is by molecular beam epitaxy (MBE). In this additive growth process atoms ar
Publikováno v:
Applied Surface Science 310(2014), 154-157
Self-organization of surface patterns on GaAs under irradiation with heavy polyatomic Au ions has been observed. The patterns depend on the ion mass, and the substrate temperature as well as the incidence angle of the ions. At room temperature, under