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Autor:
Laurent Pain, Murielle Jurdit, Yves Laplanche, Jérôme Todeschini, Hugues Leininger, Sonia Tourniol, Romuald Faure, Xavier Bossy, Ramiro Palla, Alessio Beverina, Marcel Broekaart, Fabienne Judong, Karine Brosselin, Linda Depoyan, Yannick Le Friec, Francois Leverd, Veronique De Jonghe, Emmanuelle Josse, Olivier Hinsinger, Philippe Brun, Daniel Henry, Michael Woo, Peter Stolk, Brice Tavel, Franck Arnaud
Publikováno v:
Japanese Journal of Applied Physics. 43:3755
In the frame of the ALLIANCE program between Motorola, Philips Semiconductors and STMicroelectronics, electron beam direct write (EBDW) lithography based on shaped beam projection is employed to start quickly an aggressive 65 nm program for the print
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dbc091c6d6affaf7bb299952a1c862b8
https://doi.org/10.1143/jjap.43.3755
https://doi.org/10.1143/jjap.43.3755
