Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Karey L. Holland"'
Autor:
Karey L. Holland, Pei-Ing Lee, Carter Welling Kaanta, John Edward Cronin, William J. Cote, Terrance M. Wright
Publikováno v:
1988. Proceedings., Fifth International IEEE VLSI Multilevel Interconnection Conference.
A versatile wiring technology has been developed which is suitable for high-density memory and multilevel logic applications. This fully integrated technology features CVD-tungsten (W) and planarization. Virtual W studs maximise density by reducing c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::657409d334ad0eb7cc70682187756ade
https://doi.org/10.1109/vmic.1988.14172
https://doi.org/10.1109/vmic.1988.14172
Publikováno v:
SPIE Proceedings.
Isolated to grouped linewidth bias is an important factor in determining the capability of an exposure tool. The process latitude can be significantly improved by minimizing the bias for small geometries (0.5 micron and less). The data presented here
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4384e81b1c39ff222b5c0ec08b235881
https://doi.org/10.1117/12.150437
https://doi.org/10.1117/12.150437
Autor:
Bob Patterson, Mark William Barrick, Karey L. Holland, Timothy J. Wiltshire, Katherine C. Norris, Joseph C. Vigil, Doug Bommarito, Yumiko Takamori
Publikováno v:
SPIE Proceedings.
The Micrascan II is a 0.50 NA DUV, broadband illumination (245 nm to 252 nm) step-and- scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The tool has been designed to provide 350 nm res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::853a2508ea61ccc95b777684688f85c9
https://doi.org/10.1117/12.150455
https://doi.org/10.1117/12.150455
Autor:
Eric M. Apelgren, John S. Hargreaves, Karey L. Holland, Vasanti A. Deshpande, Yumiko Takamori, Nathan S. Thane, Peter Freeman
Publikováno v:
SPIE Proceedings.
The imaging performance of IBM's positive DUV resist is evaluated on SVGL Micrascan. Preliminary results on GCA excimer laser are included. Contamination effects are studied using 0.5 micron lines and spaces on Micrascan I using cross-sections at var
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::246a0fa5e19dd5fb5c8c555370434679
https://doi.org/10.1117/12.148938
https://doi.org/10.1117/12.148938
Autor:
Denis J Poley, Katherine C. Norris, John L. Sturtevant, Steven J. Holmes, Stephen E. Knight, Karey L. Holland, Dean Writer, Andy Horr, Mark C. Hakey, Paul A. Rabidoux, J. Guidry, Dean C. Humphrey, Diana D. Dunn, Albert S. Bergendahl, D. Macaluso
Publikováno v:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II.
Lithographers have steadily reduced exposure wavelength and increased numerical aperture (NA) to maintain process window and simplicity. The G-line systems of the 1970s gave way to the I-line systems of the late 80s, and then to the deep ultraviolet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b54f316d5e8e85e16811af43e039f61
https://doi.org/10.1117/12.136040
https://doi.org/10.1117/12.136040
Autor:
Stephen E. Knight, Katherine C. Norris, Steven J. Holmes, Denis J Poley, Ruth Levy, Karey L. Holland, John G. Maltabes, Albert S. Bergendahl
Publikováno v:
Optical/Laser Microlithography III.
Each DRAM design generation has required higher reoiution imaging and overlay capability. The 500-nm lithographic ground rules of a 16-Mb chip make deep-UV (DUV) an attractive alternative to,thc more stanth,rd mid-UV (MUV) photolithography presently
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a28ca89b84633f3668c46681572ccb8a
https://doi.org/10.1117/12.20180
https://doi.org/10.1117/12.20180
Publikováno v:
Journal of Liquid Chromatography. 2:663-675
Nicotinamide adenine dinucleotide (NAD) is an important cofactor in a number of oxidoreductase enzyme systems. The detection and quantitation of its reduced form (NADH) is the basis for a number of methods which determine both substrates and enzyme a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a89963adcc25d57f77d0e8ffabaa1d8
https://doi.org/10.1080/01483917908060094
https://doi.org/10.1080/01483917908060094
Autor:
Joseph Jordan, Karey L. Holland
Publikováno v:
Electrochemical and Spectrochemical Studies of Biological Redox Components ISBN: 9780841206618
Electrochemical and Spectrochemical Studies of Biological Redox Components
Electrochemical and Spectrochemical Studies of Biological Redox Components
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4138ac45e6eae2a8900958e8e724d55
https://doi.org/10.1021/ba-1982-0201.ch014
https://doi.org/10.1021/ba-1982-0201.ch014
Autor:
KARL M. KADISH, WILLIAM R. HEINEMAN, C. WILLIAM ANDERSON, H. BRIAN HALSALL, MARILYN M. HURST, JAY M. JOHNSON, GEORGE P. KREISHMAN, BARBARA J. NORRIS, MICHAEL J. SIMONE, CHIH-HO SU, ERIC E. BANCROFT, HENRY N. BLOUNT, FRED M. HAWKRIDGE, VERNON T. TANIGUCHI, WALTHER R. ELLIS, VINCE CAMMARATA, JOHN WEBB, FRED C. ANSON, HARRY B. GRAY, RONALD L. BIRKE, JOHN R. LOMBARDI, LUIS A. SANCHEZ, J. P. GISSELBRECHT, M. GROSS, ROBERT R. GAGNÉ, ROBERT P. KREH, JOHN DODGE, EDMOND F. BOWDEN, M. J. EDDOWES, H. A. O. HILL, KATSUMI NIKI, TATSUHIKO YAGI, HIROO INOKUCHI, F. SCHELLER, G. STRNAD, A. B. P. LEVER, S. LICOCCIA, K. MAGNELL, P. C. MINOR, B. S. RAMASWAMY, ANDREAS BOTULINSKI, JOHANN WALTER BUCHLER, KIONG LAM LAY, JÜRGEN ENSLING, HANS TWILFER, JOCHEN BILLECKE, HEIKO LEUKEN, BERNHARD TONN, LAWRENCE A. BOTTOMLEY, LARRY OLSON, KAREY L. HOLLAND, JOSEPH JORDAN, CHRISTOPHER A. REED, HAROLD M. GOFF, MARTIN A. PHILLIPPI, ARDEN D. BOERSMA, ANDREW P. HANSEN, F. ANN WALKER, JUDITH A. BARRY, VIRGINIA L. BALKE, GREGORY A. McDERMOTT, MICHAEL Z. WU, PETER F. LINDE, BRIAN R. COLEM