Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry.

Autor: Pruette, L. C., Karecki, S. M., Reif, R., Langan, J. G., Rogers, S. A., Ciotti, R. J., Felker, B. S.

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1998, Vol. 16 Issue 3, p1577-1581, 5p