Acidity of Al–O(H)–Al Sites in Molecular Aluminosilicate Models Enables Alcohol Dehydration Reactions

Autor: Lukas Lätsch, Fabian Beckmann, Christian Limberg, Kapil Shyam Lokare, Christophe Copéret

Publikováno v: The Journal of Physical Chemistry C. 125:17690-17695

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::822ef06c9247a61bb9df7228aaef16de
https://doi.org/10.1021/acs.jpcc.1c04077

Structure and Reactivity of Al−O(H)−Al Moieties in Siloxide Frameworks: Solution and Gas-Phase Model Studies

Autor: John T. Kelly, Stephen Leach, Knut R. Asmis, Beatrice Braun-Cula, Marcel Jorewitz, Carsten Baldauf, Joachim Sauer, Itziar Goikoetxea, Kapil Shyam Lokare, Christian Limberg

Publikováno v: Angewandte Chemie International Edition. 58:902-906

Even though aluminas and aluminosilicates have found widespread application, a consistent molecular understanding of their surface heterogeneity and the behavior of defects resulting from hydroxylation/dehydroxylation remains unclear. Here, we study

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5a3297abd7fa6651186b9603e101be3d
https://doi.org/10.1002/anie.201810130

Atomic Layer Deposition of Silica on Carbon Nanotubes

Autor: Kapil Shyam Lokare, Matthias Karg, Guylhaine Clavel, Nicola Pinna, Christian Limberg

Publikováno v: Chemistry of Materials. 29:4920-4931

Low-temperature ozone-assisted atomic layer deposition (ALD) of SiO2 with four silane derivatives (3-aminopropyl)triethoxysilane (APTES), bis(diethylamino)silane (BDEAS), diphenylaminosilane (DPAS), and triethylsilane on carbon nanotubes (CNTs) leads

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6ca8bdf23263ab7543ebe98e2b48eaf2
https://doi.org/10.1021/acs.chemmater.7b01165

A Self-Limited Atomic Layer Deposition of WS 2 Based on the Chemisorption and Reduction of Bis( t -butylimino)bis(dimethylamino) Complexes

Autor: Kapil Shyam Lokare, Muhammad Hamid Raza, Yanlin Wu, Norbert Koch, Elsje Alessandra Quadrelli, Nicola Pinna, Xiaomin Xu, Sebastian Wahl, Kai Skrodczky, Yen-Chun Chen, Medet Zhukush, Patrick Amsalem, Pooja Gaval

Publikováno v: Chemistry of Materials
Chemistry of Materials, American Chemical Society, 2018, 31 (6), pp.1881-1890. ⟨10.1021/acs.chemmater.8b03921⟩

A novel self-terminating chemical approach for the deposition of WS2 by atomic layer deposition based on chemisorption of bis(t-butylimino)bis(dimethylamino)tungsten(VI) followed by sulfurization b...

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::229f00fa142ea155af779d9108d3455f
https://hal.archives-ouvertes.fr/hal-02367949

Microwave-assisted methylation of dihydroxybenzene derivatives with dimethyl carbonate

Autor: Thomas Maschmeyer, Matthew Y. Lui, Anthony F. Masters, Alvise Perosa, Kapil Shyam Lokare, Maurizio Selva, Ellen B. Hemming, Jessica N. G. Stanley

Using a focused microwave reactor, methylation with dimethyl carbonate (DMC) of 1,2- and 1,4-dihydroxybenzene derivatives, found in the product spectrum of lignin depolymerisation, leads to the respective aromatic bis-methyl ethers with excellent iso

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5cf60da5e2e4f796f102086915e0d28e
http://hdl.handle.net/10278/3680745