Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Kangmin Hsia"'
Autor:
Chang Ju Choi, Emily Y. Shu, Seh-Jin Park, Eric J. Lanzendorf, Guojing Zhang, Alan R. Stivers, Gilroy Vandentop, Kangmin Hsia, Peter Sanchez, Jeff Farnsworth, Manish Chandhok, Pei-yang Yan, Michael J. Leeson, Yan Du, Ted Liang
Publikováno v:
SPIE Proceedings.
It becomes increasingly important to have an integrated process for Extreme UltraViolet (EUV) mask fabrication in order to meet all the requirements for the 32 nm technology node and beyond. Intel Corporation established the EUV mask pilot line by in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6ce9eec27d37275143d35d5e2bc55ef
https://doi.org/10.1117/12.681839
https://doi.org/10.1117/12.681839
Autor:
Kangmin Hsia, Pei-yang Yan, Rajesh Nagpal, Ted Liang, Alan R. Stivers, Barry Lieberman, Fu-Chang Lo, Michael Penn, Edita Tejnil, Emily Y. Shu, Guojing Zhang
Publikováno v:
SPIE Proceedings.
The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating bar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7bab82ae6e6adf0cce6e99e23bc5f969
https://doi.org/10.1117/12.569176
https://doi.org/10.1117/12.569176
Publikováno v:
SPIE Proceedings.
KLA-Tencor has developed a fourth-generation reticle inspection system, the KLA-Tencor 570, using DUV imaging to detect 100-nm defects on advanced OPC and PSM reticles for the 0.13 micron technology node production and 0.10 micron technology developm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55965360b82c8eb9fd98155dc9065002
https://doi.org/10.1117/12.392087
https://doi.org/10.1117/12.392087
Autor:
Cyrus D. Cantrell, Kangmin Hsia
Publikováno v:
SPIE Proceedings.
By using the hydrodynamic symmetric description [1 ,2], the quasi-static model of self-focusingprocesses has been extended to include the transient effect of nonlinear medium response. This paper presents a new operator method to study the transient
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c81eb2ceb48d88e2e3dc5db8439eebf1
https://doi.org/10.1117/12.46772
https://doi.org/10.1117/12.46772
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