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Publikováno v:
Microelectronic Engineering. 83:889-892
We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7293002617afa1c61cd30cfb36213347
https://doi.org/10.1016/j.mee.2006.01.055
https://doi.org/10.1016/j.mee.2006.01.055
