Toluene oxidation over ZrO2-based gasification gas clean-up catalysts: Part A. Effect of oxygen and temperature on the product distribution

Autor: Viinikainen, Tiia, Kouva, Sonja, Lehtonen, Juha, Kanervo, Jaana

Publikováno v: In Applied Catalysis B: Environment and Energy 15 December 2016 199:523-530

1-Butanol dehydration in microchannel reactor: Kinetics and reactor modeling

Autor: Khan, Yaseen, Marin, Minna, Karinen, Reetta, Lehtonen, Juha, Kanervo, Jaana

Publikováno v: In Chemical Engineering Science 1 December 2015 137:740-751

Sorption and diffusion parameters from vacuum-TPD of ammonia on H-ZSM-5

Autor: Kouva, Sonja, Kanervo, Jaana, Schüβler, Florian, Olindo, Roberta, Lercher, Johannes A., Krause, Outi

Publikováno v: In Chemical Engineering Science 15 February 2013 89:40-48

Recommended reading list of early publications on atomic layer deposition-Outcome of the 'Virtual Project on the History of ALD'

Autor: Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Boyadjiev, Stefan, Cameron, David C., Chen, Rong, Chubarov, Mikhail, Cremers, Veronique, Devi, Anjana, Drozd, Viktor, Elnikova, Liliya, Gottardi, Gloria, Grigoras, Kestutis, Hausmann, Dennis M., Hwang, Cheol Seong, Jen, Shih-Hui, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Kim, Do Han, Klibanov, Lev, Koshtyal, Yury, Krause, A. Outi I., Kuhs, Jakob, Kaerkkaenen, Irina, Kaariainen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Lapicki, Adam A., Leskelä, Markku, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Mennad, Abdelkader, Militzer, Christian, Molarius, Jyrki, Norek, Malgorzata, Ozgit-Akgun, Cagla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Rampelberg, Geert, Ras, Robin H. A., Rauwel, Erwan, Roozeboom, Fred, Sajavaara, Timo, Salami, Hossein, Savin, Hele, Schneider, Nathanaelle, Seidel, Thomas E., Sundqvist, Jonas, Suyatin, Dmitry B., Torndahl, Tobias, van Ommen, J. Ruud, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana

Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______1593::af01abeadebbe96339dd544822489a20
http://hdl.handle.net/10138/313116

On the early history of atomic layer deposition:most significant works and applications

Autor: Aarik, Jaan, Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Cameron, David, Chekurov, Nikolai, Chubarov, Mikhail, Drozd, Viktor, Elliott, Simon, Gottardi, Gloria, Grigoras, Kestutis, Hwang, Cheol Seong, Junige, Marcel, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Koshtyal, Yury, Krause, Outi, Kääriäinen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Molarius, Jyrki, Norek, Malgorzata, Ozgit-Akgun, Cagla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Pyymaki-Perros, Alexander, Ras, Robin H. A., Roozeboom, Fred, Sajavaara, Timo, Savin, Hele, Seidel, Thomas E., Sundberg, Pia, Sundqvist, Jonas, Suyatin, Dmitry, Tallarida, Massimo, Törndahl, Tobias, Utriainen, Mikko, van Ommen, J. Ruud, Wächtler, Thomas, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana

Publikováno v: Aarik, J, Ahvenniemi, E, Akbashev, A R, Ali, S, Bechelany, M, Berdova, M, Cameron, D, Chekurov, N, Chubarov, M, Drozd, V, Elliott, S, Gottardi, G, Grigoras, K, Hwang, C S, Junige, M, Kallio, T, Kanervo, J, Khmelnitskiy, I, Koshtyal, Y, Krause, O, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Molarius, J, Norek, M, Ozgit-Akgun, C, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R L, Pyymaki-Perros, A, Ras, R H A, Roozeboom, F, Sajavaara, T, Savin, H, Seidel, T E, Sundberg, P, Sundqvist, J, Suyatin, D, Tallarida, M, Törndahl, T, Utriainen, M, van Ommen, J R, Wächtler, T, Wiemer, C, Ylivaara, O M E & Yurkevich, O 2016, ' On the early history of atomic layer deposition : most significant works and applications ', 16th International Conference on Atomic Layer Deposition, ALD 2016, Dublin, Ireland, 24/07/16-27/07/16 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::3b2b52ef81afcdd0edebc708b823184f
https://cris.vtt.fi/en/publications/03707523-8c1a-4bbc-8828-d8f850920e09