Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Kanda Singkarat"'
Autor:
S. Natyanum, Kanda Singkarat, Udomrat Tippawan, Harry J. Whitlow, Nitipon Puttaraksa, Somrit Unai, S. Singkarat, L.D. Yu, Nirut Pussadee
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 404:58-64
Developing high technologies but in economic manners is necessary and also feasible for developing countries. At Chiang Mai University, Thailand, we have developed MeV-ion microbeam technology based on a 1.7-MV Tandetron tandem accelerator with our l
Autor:
Kanda Singkarat, S. Singkarat, Harry J. Whitlow, Nirut Pussadee, Nitipon Puttaraksa, Somrit Unai, Michael W. Rhodes
Publikováno v:
Microelectronic Engineering. 102:18-21
For soft lithography, the conventional negative tone resists, such as SU-8, that are used to create the mold have a number of drawbacks. PMMA, which is normally used as a positive tone resist, can be used as a negative resist by using high-fluence ir
Autor:
Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Rhodes, Michael W., Whitlow, Harry J., Somsorn Singkarat
1, 6, Maejo International Journal of Science and Technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ec134120795852d63ba710f44837670
Autor:
S. Singkarat, Nitipon Puttaraksa, Kanda Singkarat, Somrit Unai, Harry J. Whitlow, Michael W. Rhodes
Publikováno v:
Nuclear Instruments and Methods in Physics Research B. 272:149
In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang