Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Kanaiyalal C. Patel"'
Autor:
Kanaiyalal C. Patel, R. Joseph Kline, Lei Wan, Ricardo Ruiz, Elizabeth Ashley, Daniel F. Sunday
Publikováno v:
Journal of Polymer Science Part B: Polymer Physics. 53:595-603
Block copolymer directed self-assembly (BCP) with chemical epitaxy is a promising lithographic solution for patterning features with critical dimensions under 20 nm. In this work, we study the extent to which lamellae-forming poly(styrene-b-methyl me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::118c5e764c08a1a3b645dead20958c54
https://doi.org/10.1002/polb.23675
https://doi.org/10.1002/polb.23675
Autor:
Dan S. Kercher, Jeffrey S. Lille, Daniel Bedau, Kanaiyalal C. Patel, Dieter Weller, Manfred Ernst Schabes, E. Dobisz, Lei Wan, He Gao, Ricardo Ruiz, Michael Grobis, Tsai-Wei Wu, Olav Hellwig, Thomas R. Albrecht, Ernesto E. Marinero
Publikováno v:
IEEE Transactions on Magnetics. 49:773-778
Bit patterned media (BPM) provide an alternative to conventional granular thin film recording media, circumventing the challenges of managing grain size and its associated noise and thermal stability issues in granular media. A viable fabrication str
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e1878e6641f67b5a5815a7270117b39
https://doi.org/10.1109/tmag.2012.2227303
https://doi.org/10.1109/tmag.2012.2227303
Autor:
Thomas R. Albrecht, Yi Cao, Jian Yin, Lei Wan, He Gao, Guanyang Lin, Kanaiyalal C. Patel, Ricardo Ruiz, Ji Hoon Kim
Publikováno v:
ACS nano. 9(7)
We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials having a full pitch from 27 to 18.5 nm. While directed self-assembly on chem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::45750ead46c835e48e56714df71dbc63
https://pubmed.ncbi.nlm.nih.gov/26046475
https://pubmed.ncbi.nlm.nih.gov/26046475
Autor:
Yuri N. Obukhov, Tsai-Wei Wu, Manfred Ernst Schabes, Olav Hellwig, Kurt A. Rubin, Dan S. Kercher, Zuwei Liu, Daniel Bedau, Toshiki Hirano, Bruce Alvin Gurney, Kanaiyalal C. Patel, David Berman, C. Mathew Mate, J.-M. L. Beaujour, Julia D. Cushen, Pierre-Olivier Jubert, Hitesh Arora, Alexei Bogdanov, Weldon Mark Hanson, E. Dobisz, Gregory S. Doerk, Vipin Ayanoor-Vitikkate, He Gao, Thomas R. Albrecht, Ricardo Ruiz, Michael Grobis, Dieter Weller, En Yan, Lei Wan, Yves-Andre Chapuis, Jeffrey S. Lille
Bit Patterned Media (BPM) for magnetic recording provide a route to densities $>1 Tb/in^2$ and circumvents many of the challenges associated with conventional granular media technology. Instead of recording a bit on an ensemble of random grains, BPM
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::00f6dc6adb9b80c1999233a3c756ba6a
Autor:
Jeffery Lille, Ricardo Ruiz, Thomas R. Albrecht, Paul F. Nealey, Gabriel Zeltzer, Kanaiyalal C. Patel, Alexei Bogdanov, Lei Wan, He Gao, Elizabeth A. Dobisz
Publikováno v:
Alternative Lithographic Technologies IV.
A block copolymer-directed self-assembly was combined with nanoimprint lithography to generate templates with rectangular patterns through an original double imprint process. A rotary e-beam tool was used to separately expose circumferential and radi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0529502d314d4f4220577eabf9a93984
https://doi.org/10.1117/12.916592
https://doi.org/10.1117/12.916592
Autor:
Neil Leslie Robertson, E. Dobiz, L. Wan, Thomas R. Albrecht, He Gao, Ricardo Ruiz, J. Lille, Kanaiyalal C. Patel
Publikováno v:
Alternative Lithographic Technologies IV.
Directed self-assembly is emerging as a promising technology to define sub-20nm features. However, a straightforward path to scale block copolymer lithography to single-digit fabrication remains challenging given the diverse material properties found
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55e0ce3eaa60c831d25aba58ad2abc30
https://doi.org/10.1117/12.916589
https://doi.org/10.1117/12.916589
Autor:
Lei Wan, Jeff Lille, Gregory S. Doerk, Ricardo Ruiz, He Gao, Kanaiyalal C. Patel, Yves-Andre Chapuis, Thomas R. Albrecht
Publikováno v:
Nanotechnology. 26:085304
We report the transfer of sub-10 nm half-pitch grating patterns created through a combination of block copolymer directed self-assembly and sidewall spacer-based self-aligned double patterning into Si substrates. Low substrate bias reactive ion etchi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ad2c76f0cec0860a182336964eaada5
https://doi.org/10.1088/0957-4484/26/8/085304
https://doi.org/10.1088/0957-4484/26/8/085304
Autor:
Elizabeth A. Dobisz, Danvers E. Johnston, Charles T. Black, Jeffrey S. Lille, Lei Wan, Kim Kisslinger, Kanaiyalal C. Patel, Ricardo Ruiz
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 30:06F202
Self-assembled block copolymer patterns may render more robust masks for plasma etch transfer through block-selective infiltration with metal oxides, affording opportunities for improved high contrast, high fidelity pattern transfer for sub-15 nm lit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d2391d2b195c6f17a86c9f24b096c14
https://doi.org/10.1116/1.4758773
https://doi.org/10.1116/1.4758773
Autor:
Guoliang Liu, Paul F. Nealey, Elizabeth A. Dobisz, Ricardo Ruiz, Kanaiyalal C. Patel, Thomas R. Albrecht
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29:06F204
Advances in block copolymer directed assembly have highlighted the potential of block copolymer lithography to define patterned templates for magnetic recording bit patterned media (BPM). The naturally periodic features found in block copolymer films
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ebd8f04a7fb712a709e95ea3275bdb9
https://doi.org/10.1116/1.3650697
https://doi.org/10.1116/1.3650697