Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Kamiyama, Tomoaki"'
Publikováno v:
In Journal of Structural Biology 2005 151(1):1-11
Autor:
Sakurai, Masaki *, Matsuura, Makoto, Kita, Kazuhiro, Sasaki, Hiroyuki, Nagahora, Junichi, Kamiyama, Tomoaki, Matsubara, Eiichiro
Publikováno v:
In Materials Science & Engineering A July 2004 375-377:1224-1227
Autor:
Nasu, Toshio *, Sakurai, Masaki, Kamiyama, Tomoaki, Usuki, Takeshi, Uemura, Osamu, Tokumitsu, Kazuto, Yamasaki, Tohru
Publikováno v:
In Materials Science & Engineering A July 2004 375-377:163-170
Autor:
Nasu, Toshio, Sakurai, Masaki, Kamiyama, Tomoaki, Usuki, Takeshi, Uemura, Osamu, Yamasaki, Tohru
Publikováno v:
In Journal of Non-Crystalline Solids 2002 312:319-322
Publikováno v:
In Scripta Materialia 18 May 2001 44(8-9):1297-1301
Autor:
Kamiyama, Tomoaki, Sasaki, Makoto, Otomo, Toshiya, Shibuya, Masaki, Kumagawa, Kiyoshi, Suzuki, Kenji
Publikováno v:
In Journal of Non-Crystalline Solids 2001 293:607-614
Publikováno v:
Journal of Applied Crystallography. Jun2003 Part 1, Vol. 36 Issue 3-1, p464. 5p.
Publikováno v:
Journal of Applied Crystallography. Jun2000, Vol. 33 Issue 3, p447. 4p. 1 Diagram, 1 Chart, 3 Graphs.
Publikováno v:
Bulletin of the Institute for Chemical Research, Kyoto University. 72(2):225-230
Autor:
Hiroaki Morimoto, Mikio Ishijima, Anzai Shingo, Kuwajima Tsuneaki, Hasegawa Shinichi, Naotoshi Kawaguchi, Kamiyama Tomoaki, Makito Nakatsu, Noriaki Takagi, Toshimitsu Watanabe
Publikováno v:
SPIE Proceedings.
To eliminate ammonium sulfate haze caused from sulfuric acid residue on the mask surface, we have been working for resist stripping and cleaning without the use of sulfuric acid process. This paper describes sulfate-free photomask cleaning technology