Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Kamil Ber"'
Autor:
Konrad R. Skup, Mirosław Rataj, Piotr Wawer, Mateusz Sobiecki, Kamil Ber, Konrad Rutkowski, Grzegorz Szymanski, Radoslaw Trzepalka, Roland Ottensamer, Gerald Mösenlechner, Armin Luntzer, Hyung Cho, Edmundo Guzman, Warren A. Holmes, Ronald C. Kruid, Renaud Goullioud, Jerry Mulder, Perry G. Ramsey, Albert J. Rieck, Allan J. Runkle, Mark R. Swain, Gautam Visisht, Carissa T. Weber, Roger Foltz, Tilak Hewagama, Mauro Focardi, Raoul Grimoldi
Publikováno v:
Space Telescopes and Instrumentation 2022: Optical, Infrared, and Millimeter Wave.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ae101dcd84d286eedbc3b683232d2e5
https://doi.org/10.1117/12.2629862
https://doi.org/10.1117/12.2629862
Autor:
Vladimiro Noce, Mauro Focardi, Marina Vela Nunez, Luca Naponiello, Andrea Lorenzani, Raoul Grimoldi, Elio Mangraviti, Luca Carli, Kamil Ber, Miroslaw Rataj, Konrad Rutkowski, Konrad R. Skup, Przemyslaw Nita, Giuseppina Micela, Giuseppe Malaguti, Natalia Auricchio, Emanuele Pace, Giampaolo Preti, Enzo Pascale, Giovanna Tinetti, Paul Eccleston, Elisabetta Tommasi, Mario Salatti, Raffaele Piazzolla, Pietro Bolli, Renzo Nesti, Marcella Iuzzolino, Luca Carbonaro, Ciro Del Vecchio, Debora Ferruzzi, Federico Miceli, Anna Brucalassi, Gilberto Falcini, Andrea Tozzi, Daniele Gottini
Publikováno v:
Space Telescopes and Instrumentation 2022: Optical, Infrared, and Millimeter Wave.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8558b47ea15913fb05d8f929ef14fb3a
https://doi.org/10.1117/12.2628327
https://doi.org/10.1117/12.2628327
Autor:
Romuald B. Beck, Kamil Ber
Publikováno v:
Journal of Nanomaterials, Vol 2019 (2019)
Application of low-temperature PECVD is a very tempting option for formation of ultrathin silicon layers for nanoelectronic and nanophotonic applications, as followed by annealing of this layer, regardless if executed as individual process performed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1b36bfbb5117e837c248bddd91c3a876
https://doi.org/10.1155/2019/9628984
https://doi.org/10.1155/2019/9628984
Autor:
Oliver Grimm, Säm Krucker, Kamil Ber, Stefan Koegl, Waldemar Bujwan, Konrad Skup, Marek Winkler, Andrzej Cichocki, Marcin Darmetko, M. Michalska, Grzegorz Juchnikowski
Publikováno v:
Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2019.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6db8784454e044c4b3e192f89fa5269c
https://doi.org/10.1117/12.2537272
https://doi.org/10.1117/12.2537272
Publikováno v:
Frontiers in Political Science, Vol 5 (2023)
In recent years, deliberative democracy has drawn attention as a potential way of fighting polarization. Allowing citizens to exchange arguments and viewpoints on political issues in group, can have strong conflict-mitigating effects: it can foster o
Externí odkaz:
https://doaj.org/article/2920ef6b46294125ae2a8b34232b57c8
Autor:
Romuald B. Beck, Kamil Ber
Publikováno v:
2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS).
In this work we have studied relations between three competing effects that take place during high temperature annealing of PECVD ultrathin silicon layer, namely: amorphous silicon recrystallization, amorphous silicon oxidation and oxidation of just
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef0c5b7231446c90bf7a15151115d34a
https://doi.org/10.1109/ulis.2016.7440085
https://doi.org/10.1109/ulis.2016.7440085
Autor:
Kamil Ber, Romuald B. Beck
Publikováno v:
SPIE Proceedings.
Nanoelectronic and nanophotonic applications have created a pressure on methods of fabrication double dielectric barriers stacks with ultrathin silicon layer located between dielectric layers. Among numerous possible methods, PECVD seems to be very p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31824786ec6860f6dc84c76aedba1e7e
https://doi.org/10.1117/12.2030884
https://doi.org/10.1117/12.2030884