Výsledky vyhledávání - "Kaichiro Nakano"

Syntheses and Electrochemical Properties of TEMPO Radical Substituted Silicones: Active Material for Organic Radical Batteries

Autor: Kaichiro Nakano, Kentaro Nakahara, Shigeyuki Iwasa, Masahiro Suguro, Atsunori Mori

Publikováno v: Macromolecular Chemistry and Physics. 210:1402-1407

A silicone-based radical polymer 2 was synthesized by hydrosilylation of PMHS with 4-allyl-2,2,6,6-tetramethylpiperidine-N-oxyl ether 1 in the presence of a platinum- or rhodium-catalyst. A reversible redox peak of 2 at 3.56 V (vs. Li/Li + ) was obse

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a2a0cea9aaf8ecbe260fc4a3f3db4162
https://doi.org/10.1002/macp.200900251

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LSI-to-LSI Signal Transmission at 10 Gb/s/ch Using Ultra-High Density Optoelectronic Modules

Autor: Hideyuki Ono, Katsumi Maeda, A. Noda, Chiemi Tanaka, Jyunnichi Tsuchida, Hisaya Takahashi, Takashi Ohtsuka, Hikaru Kouta, J. Sakai, Kaichiro Nakano, Hiroshi Yamaguchi

Publikováno v: Journal of Japan Institute of Electronics Packaging. 11:223-227

As the signal speed of LSIs increases, so does the need to replace copper interconnects with optical interconnects, especially for high performance computing (HPC) . The LSIs of next-generation HPC have as many as approximately 1, 000 I/O signals, so

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::01aef09ff278f9971980dc3ba0e9d707
https://doi.org/10.5104/jiep.11.223

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Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist

Autor: Shigeyuki Iwasa, Masamitsu Shirai, Katsumi Maeda, Kaichiro Nakano, Etsuo Hasegawa

Publikováno v: Japanese Journal of Applied Physics. 46:111-114

We evaluated dialkylsulfonium salts with an aromatic cyclic ketone structure (a 1-indanone, 1-tetralone, or 4-chromanone unit) as a photoacid generator for ArF chemically amplified resists. The thermal stability of the salts was affected by alkyl sub

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bc7ae87087b3bfb9ebcb04fffd4e80d7
https://doi.org/10.1143/jjap.46.111

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Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists

Autor: Kaichiro Nakano, Katsumi Maeda, Masamitsu Shirai

Publikováno v: Journal of Photopolymer Science and Technology. 19:699-703

We designed novel acrylate monomers with an alicyclic lactone group [3-oxa-4-oxotricyclo[5.3.1.06,10]undecanyl (OTCU) or 4,4-dimethyl-5-oxa-6-oxo tetracyclo[7.2.1.02,8.03,7]dodecyl (OTCD) group] for an ArF chemically amplified resist. The polymers wi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::798d8e0e33b85ddf1671ee66f292ea08
https://doi.org/10.2494/photopolymer.19.699

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Photo-acid generator having aromatic ketone structure for ArF chemically amplified resist

Autor: Kaichiro Nakano, Etsuo Hasegawa, Katsumi Maeda, Shigeyuki Iwasa

Publikováno v: Microelectronic Engineering. :771-776

We designed dialkylsulfonium salts with an aromatic ketone structure (a 1-indanone, 1-tetralone, or 4-chromanone unit) as a photo-acid generator (PAG) for ArF chemically amplified resists. Their thermal stability was affected by the alkyl subsitituen

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::47fd9a83e680ffff04f734bad8d8dafa
https://doi.org/10.1016/s0167-9317(02)00440-9

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