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Autor:
György Radnóczi, Alexander Schleusener, Vladimir Sivakov, Florian Talkenberg, Béla Pécz, Stefan Illhardt, G. Schmidl, G.K. Mussabek, Kadyrjan Dikhanbayev, Alexander S. Gudovskikh
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 33:041101
Semiconductor–insulator–semiconductor heterojunction solar cells were prepared using atomic layer deposition (ALD) technique. The silicon surface was treated with oxygen and hydrogen plasma in different orders before dielectric layer deposition.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfe1117ec518dcc875e4f2de7460c75d
https://doi.org/10.1116/1.4921726
https://doi.org/10.1116/1.4921726
