Zobrazeno 1 - 10
of 547
pro vyhledávání: '"KLUSKA, S."'
Autor:
Melo, T.P. *, Zwirtes, A.K., Silva, A.A., Lázaro, S.F., Oliveira, H.R., Silveira, K.R., Santos, J.C.G., Andrade, W.B.F., Kluska, S., Evangelho, L.A., Oliveira, H.N., Tonhati, H.
Publikováno v:
In Journal of Dairy Science October 2024 107(10):8130-8140
Neomycin Intercalation in Montmorillonite: The Role of Ion Exchange Capacity and Process Conditions.
Autor:
Rapacz-Kmita A; Faculty of Materials Science and Ceramics, AGH University of Krakow, A. Mickiewicza 30, 30-059 Krakow, Poland., Gajek M; Faculty of Materials Science and Ceramics, AGH University of Krakow, A. Mickiewicza 30, 30-059 Krakow, Poland., Dudek M; Faculty of Energy and Fuels, AGH University of Krakow, A. Mickiewicza 30, 30-059 Krakow, Poland., Kurpanik R; Faculty of Materials Science and Ceramics, AGH University of Krakow, A. Mickiewicza 30, 30-059 Krakow, Poland., Kluska S; Faculty of Materials Science and Ceramics, AGH University of Krakow, A. Mickiewicza 30, 30-059 Krakow, Poland., Stodolak-Zych E; Faculty of Materials Science and Ceramics, AGH University of Krakow, A. Mickiewicza 30, 30-059 Krakow, Poland.
Publikováno v:
Materials (Basel, Switzerland) [Materials (Basel)] 2024 Aug 25; Vol. 17 (17). Date of Electronic Publication: 2024 Aug 25.
Akademický článek
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Publikováno v:
Archives of Metallurgy and Materials, Vol 60, Iss 2, Pp 909-914 (2015)
Plasma Assisted Chemical Vapour Deposition (PA CVD) method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified
Externí odkaz:
https://doaj.org/article/4be60a148d914689a25ffafe193d557c
Akademický článek
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Autor:
Steinhauser, B., Arya, V., Jakob, L., Heinz, F., Schmiga, C., Grübel, B., Brand, A., Kluska, S., Nekarda, J.
Herein, an analysis on the impact of laser contact opening of TOPCon/SiNx stacks is presented. By etching in tetramethylammonium hydroxide (TMAH), the defect distribution in the interfacial tunnel oxide is accessed and analyzed. The defect density is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______610::0eb1091eed8d54e4811fcc3481307e36
https://publica.fraunhofer.de/handle/publica/416595
https://publica.fraunhofer.de/handle/publica/416595
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
Stodolak-Zych E; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland., Rapacz-Kmita A; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland., Gajek M; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland., Różycka A; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland., Dudek M; Faculty of Energy and Fuels, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland., Kluska S; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland.
Publikováno v:
Journal of functional biomaterials [J Funct Biomater] 2023 Mar 21; Vol. 14 (3). Date of Electronic Publication: 2023 Mar 21.
Autor:
Hatt, T., Bartsch, J., Davis, V., Richter, A., Kluska, S., Glunz, S.W., Glatthaar, M., Fischer, A.
A resist-free metallization of copper-plated contacts is attractive to replace screen-printed silver contacts and is demonstrated on large-area silicon heterojunction (SHJ) solar cells. In our approach, a self-passivated Al layer is used as a mask du
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______610::93bbc22dc6ed6d1abab1f74129daf25d
https://publica.fraunhofer.de/handle/publica/266299
https://publica.fraunhofer.de/handle/publica/266299
In typical industrial processing of tunnel oxide passivated contact (TOPCon) solar cells, poly-Si is deposited on the entire back of the cells. During the deposition process, a wrap-around of poly-Si onto the edges and the front side of the cells is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______610::43b19908110e9f19cca133a1da2db697
https://publica.fraunhofer.de/handle/publica/269895
https://publica.fraunhofer.de/handle/publica/269895