Zobrazeno 1 - 10
of 38
pro vyhledávání: '"K.D. van der Mast"'
Publikováno v:
Ultramicroscopy. 63:227-238
Electron microscopy of biological structural research has made significant advances. These advances were the stimulus to develop an electron microscope containing most of the desirable features and methods for high resolution cryo-electron microscopy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d677543592d665b9f4f5a671810494c
https://doi.org/10.1016/0304-3991(96)00038-1
https://doi.org/10.1016/0304-3991(96)00038-1
Autor:
E. H. Mulder, K.D. van der Mast
Publikováno v:
Microelectronic Engineering. 14:173-182
The shaper design has been performed as a part of a feasibility study in the High Speed Electron beam, Lithography (HISEL) project. The system under investigation should be able to write 0.1 μm patterns at 1 cm 2 /s, at 100 kV. Because of coulomb in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a97de8b22f92e4f295b75bc1f3334aad
https://doi.org/10.1016/0167-9317(91)90003-v
https://doi.org/10.1016/0167-9317(91)90003-v
Autor:
K.D. van der Mast, E. H. Mulder
Publikováno v:
Microelectronic Engineering. 13:157-160
The sharper described is to be part of the High Speed Electron lithography(HISEL) system. The system should be able to write 0.1 μm patterns at 1 cm 2 /s, at 100 kV. Because of coulomb interactions between the electrons and deflection sensitivity a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b1c4ac473114e7f6f0a54aab49655e2
https://doi.org/10.1016/0167-9317(91)90067-n
https://doi.org/10.1016/0167-9317(91)90067-n
Publikováno v:
Microelectronic Engineering. 11:325-331
Theory shows that the speed of electron beam pattern generators (EBPG's) can be improved considerably. Above that the availability of high resolution - high sensitive resists will make writing speeds in principle possible for 0.2 μm lithography - wh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e92ce7381e3c774d0902be9f66d16f53
https://doi.org/10.1016/0167-9317(90)90123-b
https://doi.org/10.1016/0167-9317(90)90123-b
Publikováno v:
Ultramicroscopy
Rather than pushing the point resolution of the electron microscope below 1A˚by increasing the voltage above 1 MeV, we have adopted a different route in which we push down the information limit and retrieve the information by image processing. This
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bdb1193400ea6515663ad5d64599e537
https://hdl.handle.net/10067/171390151162165141
https://hdl.handle.net/10067/171390151162165141
Publikováno v:
Microelectronic Engineering. 5:155-161
The ‘Ion Beam Pattern Generator’ project started in 1983 at the research group Particle Optics of the Technical University Delft. The main goal is to increase the throughput of Focused Ion Beam machines. An increase of more than one order of magn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe1f6f40a2d098e01f36773cfad73478
https://doi.org/10.1016/0167-9317(86)90042-0
https://doi.org/10.1016/0167-9317(86)90042-0
Publikováno v:
Ultramicroscopy. 21:209-222
Autofocus and correction of astigmatism of a transmission electron microscope (TEM) based on measuring a beam-tilt-induced image displacement is proposed and its theoretical limitations are studied. Tilting the illumination beam displaces the specime
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a098d59f2c588f47be1b0c22102806e
https://doi.org/10.1016/0304-3991(87)90146-x
https://doi.org/10.1016/0304-3991(87)90146-x
Publikováno v:
Microelectronic Engineering. 3:43-51
A concept is proposed for Electron-Beam Pattern Generators for increasing the theoretical writing speed at least one order of magnitude. The basic writing strategy is variable shaped single beam. A two dimensional array of high brightness electron so
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac040d1282bb4064d05c2ad0ac7f9ab2
https://doi.org/10.1016/0167-9317(85)90008-5
https://doi.org/10.1016/0167-9317(85)90008-5
Autor:
K.D. van der Mast
Publikováno v:
Ultramicroscopy. 28:81-87
In the future AEMs will become more sophisticated and complex. Detectors will be added to acquire more signals, and coincidence measurements will be used. Surface experiments will be carried out in the specimen chamber. Automation of instrument set-u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d734fb57cd2f56646baded8ee68ab874
https://doi.org/10.1016/0304-3991(89)90277-5
https://doi.org/10.1016/0304-3991(89)90277-5
Publikováno v:
Microelectronic Engineering. 7:61-89
A mass filter has been developed for use in the Delft ion beam pattern generator. The filter is made achromatic by proper combination of a magnetic and an electric field. It is capable of separating ions in the mass range 1H to 209Bi. The induction o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61b4a15c32366c84d89a8f4b72c5e4a3
https://doi.org/10.1016/0167-9317(87)90006-2
https://doi.org/10.1016/0167-9317(87)90006-2