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pro vyhledávání: '"K. W. Kukkonen"'
Autor:
D. E. Andrews, M. Q. Barton, J. Uythoven, A. I. C. Smith, J. A. Leavey, V. C. Kempson, N. Crosland, K. W. Kukkonen, J. M. Oberschmidt, C. Wasik, M. N. Wilson, M. C. Townsend, J. P. Silverman, A. J. Weger, M. C. Wilson, A. R. Jorden, R. Webber, A. D. Wilson, C. N. Archie, John Michael Warlaumont, J. C. Schouten, R. J. Anderson, R. W. Hill, J. I. Granlund, R. Palmer, L. G. Lesoine, A. E. Palumbo
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:3224
During 1991 the Oxford Instruments’ compact synchrotron x‐ray source Helios was installed at IBM’s Advanced Lithography Facility, following factory tests in Oxford during 1990. The machine has met or exceeded all performance specifications at t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e5923d7610829ad670d02869ab53aa5
https://doi.org/10.1116/1.585918
https://doi.org/10.1116/1.585918
