Zobrazeno 1 - 10
of 83
pro vyhledávání: '"K. V. Egorov"'
Publikováno v:
Вестник войск РХБ защиты, Vol 2, Iss 2, Pp 70-77 (2023)
The lecture is aimed at the improvement of the professional level of military personnel in the sphere of flamethrowerincendiary weapons of the Troops of Radiological, Chemical and Biological Protection of the Armed Forces of the Russian Federation.
Externí odkaz:
https://doaj.org/article/6d329a277e9a4d98bab948d986febe10
Autor:
E. M. Spiridonov, S. N. Belyakov, Yu. A. Ivanova, K. V. Egorov, N. N. Korotaeva, D. I. Naumov, O. V. Yapaskurt
Publikováno v:
Geology of Ore Deposits. 64:495-502
Publikováno v:
Geology of Ore Deposits. 63:842-849
Autor:
A. A. Serova, S. N. Belyakov, E. M. Spiridonov, K. V. Egorov, D. I. Naumov, N. N. Korotaeva, Yu. A. Ivanova
Publikováno v:
Moscow University Geology Bulletin. 75:472-480
Considerable amounts of menshikovite (the rare palladium–nickel arsenide Pd3Ni2As3) have been found at the eastern flank of the Oktyabrsky deposit (Norilsk ore field) near the contact of solid and impregnation sulfide Co–Ni–Cu ores within the m
Autor:
E. M. Spiridonov, S. N. Belyakov, N. N. Korotayeva, K. V. Egorov, Yu. A. Ivanova, D. I. Naumov, A. A. Serova
Publikováno v:
Moscow University Bulletin. Series 4. Geology. :22-29
Significant amount of menshikovite (rare palladium and nickel arsenide) Pd3Ni2As3was found on the Eastern flank of the Oktyabrsky deposit (Norilsk ore field), near the contact of solid and impregnation sulfide Co-Ni-Cu ores among magnetite-plagioclas
Autor:
A. A. Sigarev, Denis I. Myakota, Andrey M. Markeev, Cheol Seong Hwang, Vladimir A. Gritsenko, Sergey S. Zarubin, Dmitry S. Kuzmichev, Pavel S. Chizov, Timofey V. Perevalov, K. V. Egorov
Publikováno v:
Journal of Materials Chemistry C. 6:9667-9674
The growth per cycle saturation behaviors depending on the precursor pulse duration, reactant pulse duration, and reactant concentration were examined for hydrogen radical enhanced atomic layer deposition (REALD) of TaOx using tantalum-ethoxide as th
Publikováno v:
Rocket-Space Device Engineering and Information Systems. 4:89-93
Autor:
Anatoly A. Soloviev, Alexander Azarov, Yury Lebedinskii, Andrey M. Markeev, K. V. Egorov, Anastasia Chouprik
Publikováno v:
Applied Surface Science. 419:107-113
The clear substrate-dependent growth and delayed film continuity are essential challenges of Ru atomic layer deposition (ALD) demanding adequate and versatile approaches for their study. Here, we report on the application of in situ Angle Resolved X-
Autor:
K. V. Egorov, Pavel S. Chizhov, Cheol Seong Hwang, Dmitry S. Kuzmichev, Yuri Lebedinskii, Andrey M. Markeev
Publikováno v:
ACS Applied Materials & Interfaces. 9:13286-13292
The plasma-enhanced atomic layer deposition (PEALD) process using Ta(OC2H5)5 as a Ta precursor and plasma-activated hydrogen as a reactant for the deposition of TaOx films with a controllable concentration of oxygen vacancies (VO) is reported herein.
Publikováno v:
Russian Journal of Applied Chemistry. 89:1825-1830
TaO x films with controlled ratio of Ta4+ and Ta5+ atoms were prepared at different hydrogen concentrations in plasma. As shown by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry, the chemical state of Ta4+ corresp