Zobrazeno 1 - 10
of 392
pro vyhledávání: '"K. Tamaru"'
Publikováno v:
Applied Physics B. 92:73-77
We describe a comparative study of the emission characteristics of debris from CO2 and Nd:YAG laser-produced tin plasmas for developing an extreme-ultraviolet (EUV) lithography light source. Tin (Sn) ions and droplets emitted from a Sn plasma produce
Publikováno v:
Applied Physics A. 92:767-772
The dynamics of debris from the laser-produced tin (Sn) plasma was investigated for an extreme ultraviolet light source in order to establish the guideline for the optimum design of a mitigation system, such as a mass-limited target. The disseminatio
Publikováno v:
The Review of Laser Engineering. 36:1129-1131
In the development of extreme ultraviolet (EUV) light source for EUV lithography systems by laser-produced plasma (LPP), mass-limited targets such as a micro-droplet were considered as promising targets for debris mitigation. In our study, the dynami
Publikováno v:
SPIE Proceedings.
The results of a comparative investigation on the emission characteristics of debris from CO 2 laser-produced tin plasma and Nd: YAG laser-produced tin plasma for an extreme ultraviolet lithography (EUV) light source. The tin ions and droplets emitte
Autor:
Jerzy Haber, Jochen H. Block, P. C. Gravelle, N. Sheppard, M. W. Roberts, K. Tamaru, Alexander M. Bradshaw, R. S. Hansen
Publikováno v:
Pure and Applied Chemistry. 62:2297-2322
The major techniques presently used for characterising solid surfaces are summarized. These techniques include interactions (or release) of photons, electrons and neutral or charged atoms and molecules, and other miscellaneous methods which may be ap
Publikováno v:
2007 Conference on Lasers and Electro-Optics - Pacific Rim.
Debris, generated form a laser-produced Sn plasma extreme-ultraviolet source for the next generation optical lithography, was investigated by the laser-induced fluorescence (LIF) imaging for Sn atoms and a Faraday cup for ionic species. The sputterin
Publikováno v:
SPIE Proceedings.
In the development of extreme ultraviolet (EUV) light source for EUV lithography systems by laser-produced plasma (LPP), reduction of debris emitted from the plasma such as ions, droplets and neutral atoms is one of the most important factors. In our
Akademický článek
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Akademický článek
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Publikováno v:
COMPCON '77.