Zobrazeno 1 - 3
of 3
pro vyhledávání: '"K. T. Kohlmann‐von Platen"'
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:4262
H2O vapor as the etching medium has been investigated for electron beam induced etching of an organic resist. The aim was the determination of the dependencies on the process parameters. The etch rate increases with decreasing beam energy and increas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::171b2561c42d919a7e006be63924dc24
https://doi.org/10.1116/1.588587
https://doi.org/10.1116/1.588587
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2219
Electron‐beam induced deposition of tungsten from the precursor gas W(CO)6 was investigated with the aim of determining the resolution limiting parameters. By exploring the effect of the beam energy and current, the resolution was found to correlat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76e0692827a98693a8c3459c9c48944d
https://doi.org/10.1116/1.586460
https://doi.org/10.1116/1.586460
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:2690
Electron‐beam induced deposition (EBID) of tungsten from the precursor gas W(CO)6 was investigated with the aim of enhancing the growth rate of the process. By varying dwell and loop time over a limited range, experimental deposition rates were com
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d439d6cdc3b45a3fd1d54cc24394157
https://doi.org/10.1116/1.586027
https://doi.org/10.1116/1.586027