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pro vyhledávání: '"K. S. Tremaine"'
Autor:
M. G. R. Thomson, C. R. Blair, M. G. Rosenfield, R. P. Volant, F. J. Hohn, P. J. Coane, K. T. Kwietniak, T. H. Newman, K. S. Tremaine, J. Keller, D. Klaus
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2615
Direct write electron‐beam lithography is the most flexible technique for sub‐0.25 μm imaging in an advanced development environment. The resolution and custom exposure capabilities of electron‐beam lithography, as well as the rapid turnaround
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c52cc60be348a78a55d35829c0f687fa
https://doi.org/10.1116/1.586636
https://doi.org/10.1116/1.586636
