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pro vyhledávání: '"K. R. McClain"'
Autor:
J. C. Revelli, Arijit Koley, Timothy J. Anderson, Christopher O’Donohue, K. R. McClain, Lisa McElwee-White
Publikováno v:
ECS Journal of Solid State Science and Technology. 4:N3180-N3187
Deposition of high quality WNxCy barrier films at very low temperature using aerosol-assisted chemical vapor deposition (AACVD) is reported. The single-source tungsten nitrido complex, WN(NEt2)3, was designed to reduce the temperature required for WN
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b947117a94b0cd073de9955c49abcc9
https://doi.org/10.1149/2.0251501jss
https://doi.org/10.1149/2.0251501jss
