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Publikováno v:
Physical review / B 98(11), 115113 (2018). doi:10.1103/PhysRevB.98.115113
Perovskite $\mathrm{SrIr}{\mathrm{O}}_{3}$ (SIO) films epitaxially deposited with a thickness of about 60 nm on various substrate materials display a nearly strain-relieved state. Films grown on orthorhombic (110) $\mathrm{DySc}{\mathrm{O}}_{3}$ (DSO
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https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec2afe78572ca1980729a9c78fc6aa8a
