Zobrazeno 1 - 10 of 249 pro vyhledávání: '"K. Osseo‐Asare"'
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Interpretation of impedance data for reinforcing steel in alkaline solution containing chlorides and acetates
Autor: Howard W. Pickering, J. Flis, K. Osseo-Asare
Publikováno v: Electrochimica Acta. 43:1921-1929
Electrochemical impedance spectroscopy (EIS) and cyclic voltammetry were used to study the corrosion of reinforcing steel in a simulated pore solution with and without additions of chloride ions (0.5 M KCl), and calcium magnesium acetate (CMA) (0.2 M
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::489aae35b9b96ea8cedb52b2626c1ce8
https://doi.org/10.1016/s0013-4686(97)10004-4
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Semiconductor Electrochemistry of Particulate Pyrite: Mechanisms and Products of Dissolution
Autor: Dawei Wei, K. Osseo‐Asare
Publikováno v: Journal of The Electrochemical Society. 144:546-553
Pyrite dissolution in acidic solution was found to occur via both electrochemical oxidation and chemical decomposition. The mechanism of chemical decomposition of pyrite in acidic solution may involve surface complexation of hydrogen ions. The anodic
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2e7fd9b310c67525a77f3703cdca2ac5
https://doi.org/10.1149/1.1837446
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[Untitled]
Autor: Dongyang Li, K. Osseo-asare
Publikováno v: Journal of Materials Science. 32:5525-5532
The texture of copper deposits produced in the bath containing potassium chloride changes with the content of the potassium chloride. This change in texture was usually explained to be caused by chloride adsorption on the cathode. This paper reports
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::873a161583803e3e6c7ce55ce4206202
https://doi.org/10.1023/a:1018664222034
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Etching Kinetics of Silicon Dioxide in Aqueous Fluoride Solutions: A Surface Complexation Model
Autor: K. Osseo-Asare
Publikováno v: Journal of The Electrochemical Society. 143:1339-1347
A molecular-level model of SiO 2 dissolution in aqueous fluoride solutions is presented. The model recognizes the fact that the SiO 2 /water interface contains neutral hydroxylated surface groups (Si-OH) which can protonate to give positively charged
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::dee4075835a28d722b683f85fefeef89
https://doi.org/10.1149/1.1836640
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The Kinetics of Dissolution of Copper and Iron in Aqueous Cupric Ammine Solutions
Autor: Ichiro Takemura, K. Osseo-Asare, Masanori Tokuda, Satoshi Uchida
Publikováno v: ISIJ International. 36:522-527
The dissolution rate of metallic copper plate in aqueous cupric ammine solutions was studied at 0.05-1.0 mol//CuSO4 concentration, 0-3000 rpm rotation speed and temperatures between 10-90°C. The dissolution rate was mainly controlled by chemical rea
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1b16b09e169a2ac4e132c9e563bd1333
https://doi.org/10.2355/isijinternational.36.522
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Adsorption as a Method of Doping 3-mol%-Yttria-Stabilized Zirconia Powder with Copper Oxide
Autor: K. Osseo‐Asare, John R. Seidensticker, Merrilea J. Mayo
Publikováno v: Journal of the American Ceramic Society. 76:1844-1848
The adsorption behavior of Cu[sup 2+] on 3-mol%-yttria-stabilized tetragonal zirconia polycrystalline (3Y-TZP) powder was studied. There is a window of pH values (10 < pH < 11) where adsorption may be used as a method of doping 3Y-TZP with Cu[sup 2+]
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0391875075ef57b9887f747b5bdb0c76
https://doi.org/10.1111/j.1151-2916.1993.tb06657.x
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