Zobrazeno 1 - 5
of 5
pro vyhledávání: '"K. N. Ratnakumar"'
Publikováno v:
Applied Physics Letters. 36:425-428
Electronic defect levels in scanned electron‐beam annealed (SEBA) silicon have been measured by deep‐level transient spectroscopy. In As+‐implanted p‐n junctions, hole‐trap densities in the 1013‐cm−3 range have been achieved with the do
Autor:
K. N. Ratnakumar, C. Dattatreyan
Publikováno v:
IETE Journal of Research. 22:791-796
Studies on commercial X-band Gunn diodes mounted in fully-reduced height waveguide are reported. Measurements of power output and frequency of oscillation as a function of position of an adjustable short circuit plane were made on diodes biased at ro
Publikováno v:
Applied Physics Letters. 35:463-466
A commercial scanning electron microscope, modified for high‐current operation, has been successfully used to anneal silicon layers driven amorphous by high doses of implanted arsenic. Selected‐area electron channeling patterns indicate complete
Publikováno v:
Journal of Vacuum Science and Technology. 16:1843-1846
A commercial scanning electron microscope, modified for high current operation, has been successfully used to anneal arsenic implanted silicon. The measured parameters of the electron–beam are shown to fit a model for localized heating, taking into
Autor:
K. N. Ratnakumar, D. Kakati
Publikováno v:
Physica Status Solidi (a). 45:K13-K16