Zobrazeno 1 - 10
of 19
pro vyhledávání: '"K. L. Sequoia"'
Autor:
Y. Tao, Beau O’Shay, Farrokh Najmabadi, K. L. Sequoia, Mark S. Tillack, Sivanandan S. Harilal
Publikováno v:
Journal of Physics D: Applied Physics. 39:4027-4030
The dynamics of laser-produced plasma (LPP) and its shockwave-induced density jump (SIDJ) were investigated in low-pressure ambient air during the laser pulse using an optical interferometer. A tiny SIDJ could be observed clearly in ambient air with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9cbd1f4521b2dbbb435b62c1cd53cbf8
https://doi.org/10.1088/0022-3727/39/18/014
https://doi.org/10.1088/0022-3727/39/18/014
Publikováno v:
Journal de Physique IV (Proceedings). 133:985-988
We used the Hyades [1] and Helios [2] radiation-hydrodynamic simulation tools, and the Cretin atomic kinetics code [3] to model low-density SiO 2 aerogel carriers doped with trace amounts of Ti and subjected to high-energy pulsed laser irradiation. U
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::10db0d5f9293a69d8bdcfda85eca48da
https://doi.org/10.1051/jp4:2006133198
https://doi.org/10.1051/jp4:2006133198
Publikováno v:
2009 IEEE International Conference on Plasma Science - Abstracts.
The ion energy and charge state spectrum far away from a laser produced plasma source is investigated with an electrostatic ion analyzer (EIA) probe. The effects of the wavelength of the pump laser are observed by using both a Nd:YAG laser with 1 µm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60554e3139d83c682dabddbd1ad94afc
https://doi.org/10.1109/plasma.2009.5227298
https://doi.org/10.1109/plasma.2009.5227298
Publikováno v:
2009 IEEE International Conference on Plasma Science - Abstracts.
We will present experimental and numerical investigations on the plasma physics dominating generation and transport of in-band (2% bandwidth) 13.5 nm EUV emission in laser-produced Sn-based plasmas. Atomic data for Sn at the temperature (30–60 eV)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::857cecd61e9f8af80d0c9473a3fd5f81
https://doi.org/10.1109/plasma.2009.5227662
https://doi.org/10.1109/plasma.2009.5227662
Publikováno v:
Alternative Lithographic Technologies.
The depth of mass ablation in planar Sn targets during the interaction with a pulsed Nd:YAG laser was investigated. The pulse duration and laser spot size were fixed, and the laser energy was varied to achieve laser intensities from approximately 10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0c5eed688368cee00500b6f6c8251d8
https://doi.org/10.1117/12.814233
https://doi.org/10.1117/12.814233
Publikováno v:
Alternative Lithographic Technologies.
Previous experiments on Nd:YAG laser produced Sn plasmas showed little dependence of the location of the dominant in-band extreme ultraviolet emitting region on target geometry. Modeling and experiments were preformed in order to better understand th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ea521956b91cd61163a2c93b7b1a4de
https://doi.org/10.1117/12.814167
https://doi.org/10.1117/12.814167
Publikováno v:
SPIE Proceedings.
Dynamics of laser-produced Sn-based plasmas were investigated for a monochromatic EUV lithography (EUVL) source. A hollow plasma density in a Sn plasma driven by Nd:YAG laser was observed in the late time within the laser pulse. The possible reason c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d0432fda36d9934d4a61d49a06e3f40c
https://doi.org/10.1117/12.731032
https://doi.org/10.1117/12.731032
Publikováno v:
2007 IEEE 34th International Conference on Plasma Science (ICOPS).
Summary form only given. In the pursuit to find a suitable source for EUV lithography, many people have studied laser-produced plasmas using 1.064 micron lasers with a pulse duration ranging from 1.2 ns up to 15 ns. There is also work that shows that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ba48a0b63759c8ba5e103ad14baef1c
https://doi.org/10.1109/ppps.2007.4346077
https://doi.org/10.1109/ppps.2007.4346077
Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source
Publikováno v:
Optics letters. 32(10)
A thin Sn film was investigated as a mass-limited target for an extreme ultraviolet (EUV) lithography source. It was found that those energetic ions that are intrinsic with the mass-limited Sn target could be efficiently mitigated by introducing a lo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b118db8cc72a23708525d278e03f1f96
https://pubmed.ncbi.nlm.nih.gov/17440580
https://pubmed.ncbi.nlm.nih.gov/17440580
Publikováno v:
SPIE Proceedings.
We present efforts to mitigate debris from laser-produced Sn plasma by introducing a low energy pre-pulse while keeping high in-band conversion efficiency from laser to 13.5 nm extreme ultraviolet (EUV) light. The basic idea is to separate the proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::755b012612fc3682a1de03c4342e181d
https://doi.org/10.1117/12.725806
https://doi.org/10.1117/12.725806