Zobrazeno 1 - 10
of 32
pro vyhledávání: '"K. K. Chattopadhyay"'
Publikováno v:
Journal of The Institution of Engineers (India): Series D. 103:629-638
Publikováno v:
Physical Chemistry Chemical Physics. 24:28271-28282
Due to the dual features of EDLC and pseudocapacitance the low-temperature developed MnWO4 nanostructures with different aspect ratio showed good electrochemical properties. DFT study provided the quantum capacitance value.
Publikováno v:
Toughened Composites ISBN: 9780429330575
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::472079bde97a4aa982f6572c861e871b
https://doi.org/10.1201/9780429330575-14
https://doi.org/10.1201/9780429330575-14
Publikováno v:
ChemPhysChem. 23
Using extensive first principles protocols, a systematic investigation is performed to probe the oxygen reduction reaction (ORR) mechanism on nitrogen (N) doped graphynes (Gys, e. g. αGy, βGy, γGy and 6,6,12Gy) and graphdiyne (Gdy) in alkaline med
Autor:
Kritika Jain, P. Bhowmick, B. Das, J. Sarkar, A. Gain, U.K. Ghorai, K. K. Chattopadhyay, diptonil banerjee
Publikováno v:
Materials Today Communications. 33:104665
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 33(38)
CuBO
Publikováno v:
Science of Advanced Materials. 6:640-647
Publikováno v:
Journal of nanoscience and nanotechnology. 16(3)
Hybrid photodetector with a maximum external quantum efficiency of ~3.08% in the UV region at 370 nm, was fabricated by spin-coated poly(methyl methacrylate) (PMMA) polymer onto glancing angle deposited (GLAD) vertically aligned TiO2 nanowire (NW) ar
Publikováno v:
AIP Conference Proceedings.
Polyaniline thin film has been prepared on paper by aniline vapor deposition technique. Ferric chloride has been used as polymerizing agent in this approach. The prepared films were studied through electrical resistivity and optical properties measur
Publikováno v:
Journal of nanoscience and nanotechnology. 15(5)
Glancing angle deposited TiO2 nanowires (NWs) were doped with nitrogen (N) using plasma-enhanced chemical vapour deposition technique, under the treatment of N2/Ar plasma. A red shift (- 0.51 eV) in the main band transition and oxygen defect related