Zobrazeno 1 - 10
of 193
pro vyhledávání: '"K. Ellmer"'
Autor:
Abdurashid Mavlonov, A. Smaali, S. Lafane, Mohamed Kechouane, Steffen Richter, K. Ellmer, O. Nemraoui, S. Abdelli-Messaci, Jörg Lenzner
Publikováno v:
Thin Solid Films. 700:137892
ZnO and vanadium-doped ZnO (0.7–4.1 at.%) thin films were deposited onto corning glass substrates by the pulsed laser deposition technique using a KrF excimer laser (λ = 248 nm). The films were deposited at 500 °C under an oxygen pressure of 1 Pa
Autor:
K. Ellmer
Publikováno v:
physica status solidi (b). 245:1745-1760
The semiconductor tungsten disulfide (WS2) exhibits van der Waals bonding, crystallizes in a layer-type structure and is of interest as an absorber layer for thin-film solar cells. In this review article different preparation routes for WS2 thin film
Publikováno v:
Surface & Coatings Technology 200(2005)(1-4), 341-345
Chromium oxynitride films CrO x N y were prepared by reactive magnetron sputtering from a chromium target in Ar/O 2 (N 2 O)/N 2 gas mixtures. The argon-to-nitrogen partial pressure ratio and the DC discharge power were kept constant in the experiment
Publikováno v:
Measurement Science and Technology. 14:336-345
Energy-dispersive x-ray diffraction (EDXRD) with synchrotron light can be used for in situ-structural analysis during polycrystalline thin-film growth, due to its fast data collection and the fixed diffraction angle. An in situ deposition and analysi
Publikováno v:
Surface and Coatings Technology. :1094-1099
Using the new analytical technique of in situ energy dispersive X-ray diffraction (EDXRD) during magnetron sputtering, the phase and structure formation in tin-doped indium oxide films (ITO) has been investigated. Due to the parallel data collection
Autor:
R. Mientus, K. Ellmer
Publikováno v:
Surface and Coatings Technology. :748-754
Tin-doped indium oxide (ITO) films have been prepared by reactive magnetron sputtering from a metallic alloy target onto unheated substrates. In a systematic study, the influence of the working pressure and the discharge mode (DC, pulsed DC or RF) on
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. :1041-1044
A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in sit
Autor:
K. Ellmer, R. Mientus
Publikováno v:
Surface and Coatings Technology. :1102-1106
A sensor, first described by Gardon (R. Gardon, Rev. Sci. Instrum., 24 (1953) 366) for the measurement of heat fluxes, is used for the measurement of the total power flux to a substrate during magnetron sputtering. The signal of this calorimetric sen
Publikováno v:
Solid State Communications. 111:235-240
By indiffusion of a thin metallic cobalt layer into a pyrite film deposited by metal organic chemical vapour deposition (MOCVD), cobalt doped pyrite (FeS2) films have been prepared. The cobalt in these films acts as a donor and transforms the origina
Autor:
K. Ellmer
Publikováno v:
Solid State Phenomena. :261-268