Zobrazeno 1 - 10
of 107
pro vyhledávání: '"K. Doverspike"'
Autor:
D. Slater, D. Emerson, K. Doverspike, John A. Edmond, K. Haberern, G. E. Bulman, Hua-Shuang Kong, H. Dieringer
Publikováno v:
Materials Science Forum. :1477-1482
Publikováno v:
Scopus-Elsevier
Publikováno v:
Journal of Materials Research. 12:646-650
Scanning tunneling microscopy images are reported for the wurtzite GaN(0001) surface. Terraces are observed, with three kinds of defect structures that are assigned to ordered N-vacancies: (i) striations perpendicular to the step edges, (ii) row defe
Publikováno v:
Solid-State Electronics. 41:177-180
The d.c., microwave, and high-temperature characteristics of Si-doped MESFETs with and without n+ ohmic contact layers, Si 3 N 4 GaN MISFETs, and AlN GaN HFETs are presented. The highest transconductance and microwave performance were observed for 1
Publikováno v:
Superlattices and Microstructures. 20:145-148
The wurtzite GaN(0001) surface is imaged by scanning tunneling microscopy. Terraces are observed with line-defect structures on them: primarily regularly spaced striations perpendicular to step edges. A model of these striations as ordered N-vacancie
Autor:
Y. J. Wang, H. K. Ng, T. Ikedo, Isamu Akasaki, H. Amono, D. K. Gaskill, K. Doverspike, Robert S. Kaplan
Publikováno v:
Journal of Applied Physics. 79:8007-8010
Magneto‐optical experiments have been performed on free and bound electrons in GaN films and GaN/AlGaN heterojunctions. Cyclotron resonance of two dimensional electron gas in GaN/ AlxGa1−xN heterojunctions has yielded m* = 0.23 m0, x‐dependent
Publikováno v:
Journal of Applied Physics. 79:110-119
The growth, structure, and annealing behavior of Al films, formed by in situ vapor deposition on GaN(0001)–(1×1) near 25 °C, have been studied using Auger, electron energy loss, x ray and ultraviolet photoemission spectroscopies and low‐energy
Autor:
F. K. Koschnick, Johann Martin Spaeth, K. Doverspike, D. K. Wickenden, D. Kurt Gaskill, Evan R. Glaser, Larry B. Rowland
Publikováno v:
Materials Science Forum. :37-42
Autor:
Jaime A. Freitas, Alma Wickenden, D. K. Gaskill, K. Doverspike, Larry B. Rowland, Peter H. Chi, David S. Simons
Publikováno v:
Journal of Electronic Materials. 24:1547-1550
The silicon doping of n-type GaN using disilane has been demonstrated for films grown on sapphire substrates by low pressure organometallic vapor phase epitaxy. The binding energy of an exciton bound to a neutral Si donor has been determined from low
Publikováno v:
Journal of Electronic Materials. 24:1525-1530
The growth issues known to effect the quality of GaN organometallic vapor phase epitaxial films are reviewed and the best 300Kmobility vs electron concentration data are discussed. The data probably represent transport properties intrinsic to films g