Zobrazeno 1 - 8
of 8
pro vyhledávání: '"K. B. Klepper"'
Autor:
Mikko Ritala, Ville Miikkulainen, M. Parenti, Miia Mäntymäki, Michelle M. Paquette, Sean W. King, J. Bielefeld, E. Mays, William A. Lanford, Nancy J. Dudney, Wyatt E. Tenhaeff, Donghyi Koh, Anthony N. Caruso, Jani Hämäläinen, Sanjay K. Banerjee, K. B. Klepper, Bradley J. Nordell, Ola Nilsen
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 371:211-215
In this paper, 15N nuclear reaction analysis (NRA) for H is combined with 1.2 MeV deuteron (D) NRA which provides a simultaneous analysis for Li, Be, B, C, N, O and F. The energy dependence of the D NRA has been measured and used to correct for the D
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b65380ecd0a8d150fdb66b714a4d16c
https://doi.org/10.1016/j.nimb.2015.10.052
https://doi.org/10.1016/j.nimb.2015.10.052
Autor:
Ola Nilsen, Ville Miikkulainen, Dhanadeep Dutta, Han Li, Helmer Fjellvåg, David W. Gidley, Liza Ross, William A. Lanford, Ming Liu, Sean W. King, K. B. Klepper
Publikováno v:
MRS Proceedings. 1791:15-20
The material properties of atomic layer deposited hybrid organic-inorganic aluminate thin films have been evaluated for potential low dielectric constant (i.e. low-k) applications. The hybrid aluminates were deposited using trimethyl aluminum and var
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ce266f39e25095efbd79dff6e829e10
https://doi.org/10.1557/opl.2015.519
https://doi.org/10.1557/opl.2015.519
Publikováno v:
Dalton Trans.. 43:3492-3500
A main goal in the construction of thin films is to control film growth in all aspects. Accurate control of the building blocks and their reaction sites is one way to achieve that. This is a key feature of the atomic layer deposition (ALD) technique.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1a1c9a8e636fde3949804ab277dfcf6e
https://doi.org/10.1039/c3dt52391h
https://doi.org/10.1039/c3dt52391h
Publikováno v:
European Journal of Inorganic Chemistry. 2011:5305-5312
The atomic layer deposition (ALD) technique has been further developed as a tool for producing thin films of organic–inorganic hybrid materials. Trimethylaluminium (TMA) and unsaturated linear carboxylic acids such as maleic acid, fumaric acid and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c7a9638f88675a3b9f5c4bfc1e13def
https://doi.org/10.1002/ejic.201100192
https://doi.org/10.1002/ejic.201100192
Publikováno v:
ECS Transactions. 16:3-14
The atomic layer deposition (ALD) technique has proved to be very suitable for deposition of thin films of organic- inorganic hybrid type of materials. This class of materials combines the rigid structures and physical properties of inorganic materia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39d492eb97ff004177a8027d2c1ed6e2
https://doi.org/10.1149/1.2979975
https://doi.org/10.1149/1.2979975
Publikováno v:
Journal of Crystal Growth. 307:457-465
Highly oriented thin films of cobalt oxide were made by the atomic layer deposition (ALD) technique, using Co(thd)2 (Hthd=2,2,6,6-tetramethylheptan-3,5-dione) and ozone as precursors. Films were deposited on single-crystalline substrates of MgO(1 0 0
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f31926254cb8bc7537016dab4105ab5
https://doi.org/10.1016/j.jcrysgro.2007.06.028
https://doi.org/10.1016/j.jcrysgro.2007.06.028
Publikováno v:
Thin Solid Films. 515:7772-7781
Thin films of cobalt oxide were made by atomic layer deposition (ALD), using Co(thd) 2 (Hthd = 2,2,6,6-tetramethylheptan-3,5-dione) and ozone as precursors. Films were deposited on soda–lime glass and single crystals of Si(100). Pulse and purge par
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a668bcb9d0bb667e4e90f265c2fe3e0
https://doi.org/10.1016/j.tsf.2007.03.182
https://doi.org/10.1016/j.tsf.2007.03.182
Publikováno v:
Dalton Transactions. 40:4636
Atomic layer deposition (ALD) has successfully provided thin films of organic-inorganic hybrid materials based on saturated linear carboxylic acids and trimethylaluminium (TMA). Films were grown for seven carboxylic acids: oxalic, malonic, succinic,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bb3e07a08637086296f1115597c0b621
https://doi.org/10.1039/c0dt01716g
https://doi.org/10.1039/c0dt01716g