Atomic Layer Deposited Hybrid Organic-Inorganic Aluminates as Potential Low-k Dielectric Materials

Autor: Ola Nilsen, Ville Miikkulainen, Dhanadeep Dutta, Han Li, Helmer Fjellvåg, David W. Gidley, Liza Ross, William A. Lanford, Ming Liu, Sean W. King, K. B. Klepper

Publikováno v: MRS Proceedings. 1791:15-20

The material properties of atomic layer deposited hybrid organic-inorganic aluminate thin films have been evaluated for potential low dielectric constant (i.e. low-k) applications. The hybrid aluminates were deposited using trimethyl aluminum and var

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0ce266f39e25095efbd79dff6e829e10
https://doi.org/10.1557/opl.2015.519

Atomic Layer Deposition of Organic–Inorganic Hybrid Materials Based on Unsaturated Linear Carboxylic Acids

Autor: Helmer Fjellvåg, K. B. Klepper, Thomas Levy, Ola Nilsen

Publikováno v: European Journal of Inorganic Chemistry. 2011:5305-5312

The atomic layer deposition (ALD) technique has been further developed as a tool for producing thin films of organic–inorganic hybrid materials. Trimethylaluminium (TMA) and unsaturated linear carboxylic acids such as maleic acid, fumaric acid and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6c7a9638f88675a3b9f5c4bfc1e13def
https://doi.org/10.1002/ejic.201100192

Epitaxial growth of cobalt oxide by atomic layer deposition

Autor: Ola Nilsen, K. B. Klepper, Helmer Fjellvåg

Publikováno v: Journal of Crystal Growth. 307:457-465

Highly oriented thin films of cobalt oxide were made by the atomic layer deposition (ALD) technique, using Co(thd)2 (Hthd=2,2,6,6-tetramethylheptan-3,5-dione) and ozone as precursors. Films were deposited on single-crystalline substrates of MgO(1 0 0

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5f31926254cb8bc7537016dab4105ab5
https://doi.org/10.1016/j.jcrysgro.2007.06.028

Atomic layer deposition of organic–inorganic hybrid materials based on saturated linear carboxylic acids

Autor: Helmer Fjellvåg, Ola Nilsen, Per-Anders Hansen, K. B. Klepper

Publikováno v: Dalton Transactions. 40:4636

Atomic layer deposition (ALD) has successfully provided thin films of organic-inorganic hybrid materials based on saturated linear carboxylic acids and trimethylaluminium (TMA). Films were grown for seven carboxylic acids: oxalic, malonic, succinic,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bb3e07a08637086296f1115597c0b621
https://doi.org/10.1039/c0dt01716g

Conformal Zn-Benzene Dithiol Thin Films for Temperature-Sensitive Electronics Grown via Industry-Feasible Atomic/Molecular Layer Deposition Technique.

Autor: Philip A; Department of Chemistry and Materials Science, Aalto University, Espoo, FI-00076, Finland.; Chipmetrics Ltd, Joensuu, 80130, Finland., Jussila T; Department of Chemistry and Materials Science, Aalto University, Espoo, FI-00076, Finland., Obenlüneschloß J; Inorganic Materials Chemistry, Ruhr University Bochum, 44801, Bochum, Germany., Zanders D; Inorganic Materials Chemistry, Ruhr University Bochum, 44801, Bochum, Germany., Preischel F; Inorganic Materials Chemistry, Ruhr University Bochum, 44801, Bochum, Germany., Kinnunen J; Chipmetrics Ltd, Joensuu, 80130, Finland., Devi A; Inorganic Materials Chemistry, Ruhr University Bochum, 44801, Bochum, Germany.; Leibniz Institute for Solid State and Materials Research, 01069, Dresden, Germany.; Chair of Materials Chemistry, Dresden University of Technology, 01069, Dresden, Germany., Karppinen M; Department of Chemistry and Materials Science, Aalto University, Espoo, FI-00076, Finland.

Publikováno v: Small (Weinheim an der Bergstrasse, Germany) [Small] 2024 Oct; Vol. 20 (40), pp. e2402608. Date of Electronic Publication: 2024 Jun 09.