Zobrazeno 1 - 10
of 82
pro vyhledávání: '"K Dirscherl"'
Autor:
S. Horender, K. Auderset, P. Quincey, S. Seeger, S. N. Skov, K. Dirscherl, T. O. M. Smith, K. Williams, C. C. Aegerter, D. M. Kalbermatter, F. Gaie-Levrel, K. Vasilatou
Publikováno v:
Atmospheric Measurement Techniques, Vol 14, Pp 1225-1238 (2021)
A new facility has been developed which allows for a stable and reproducible production of ambient-like model aerosols (PALMA) in the laboratory. The set-up consists of multiple aerosol generators, a custom-made flow tube homogeniser, isokinetic samp
Externí odkaz:
https://doaj.org/article/54f9a731b2104fb28013060f635691b2
Autor:
C Motzkus, Oa Kruger, K Dirscherl, E Buhr, Fu We, Ichiko Misumi, Kayori Takahashi, Y Shi, Cs Kim, Kensei Ehara, Ma Lawn, Ak JAmting, L. Adlem, J Garnas, Toshiyuki Takatsuji, Sj Cho, J Damasceno, Sitian Gao, Kentaro Sugawara, Jan Herrmann, Va Coleman, Michael Krumrey, E Enrico, Hj Catchpoole, Hf Weng, Jcv de Oliveira, J Salas, Toshiyuki Fujimoto, Felix Meli, Harald Bosse, Jariya Buajarern, Satoshi Gonda, Hl Lin, Gian Bartolo Picotto, Keiji Takahata, H.-U. Danzebrink, J Liu
Publikováno v:
Metrologia. 56:04004
Nanoparticles with size in the range from 10 nm to 300 nm and from three different materials (Au 10 nm, Ag 20 nm, and PSL 30 nm, 100 nm and 300 nm) were used in this supplementary comparison. The selected nanoparticles meet the requirements of differ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7a29d41d6715b7c5765e804b30332c24
https://doi.org/10.1088/0026-1394/56/1a/04004
https://doi.org/10.1088/0026-1394/56/1a/04004
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Publikováno v:
Measurement Science and Technology. 18:510-519
A new algorithm is presented that evaluates the critical dimension (CD) of nanostructures from scanning electron microscopy (SEM) images. The algorithm is based on the physical modelling of the SEM image formation and evaluates both top and bottom CD
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f4b302f55711154160ff6c5040afc07
https://doi.org/10.1088/0957-0233/18/2/s26
https://doi.org/10.1088/0957-0233/18/2/s26
Publikováno v:
SPIE Proceedings.
A new algorithm for SEM CD evaluation of trapezoidal line structures is presented. It is based on the physical modeling of SEM image formation and allows the assignment of top and bottom structural edge positions to the SEM signal. The SEM image prof
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ad7d8215157b5c9eb8d7eb76e64767e
https://doi.org/10.1117/12.712503
https://doi.org/10.1117/12.712503
Autor:
Matthias Wurm, Bernd Bodermann, Alexander Diener, Gerd Ehret, K. Dirscherl, C. G. Frase, Egbert Buhr
Publikováno v:
SPIE Proceedings.
Measurement and control of edge profiles and edge angles is increasingly important in advanced lithography. Especially for critical dimension metrology a sophisticated multi-dimensional shape metrology is highly beneficial. Different types of dimensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f026ba3fdb7ed28eb90c45b111f850e1
https://doi.org/10.1117/12.712137
https://doi.org/10.1117/12.712137
Autor:
R. Liebe, Harald Bosse, J. Richter, Bernd Bodermann, F. Gans, S. Czerkas, C. G. Frase, K. Dirscherl, Th. Heins, W. Häβler-Grohne
Publikováno v:
22nd European Mask and Lithography Conference.
Different type of CD metrology instrumentation is in use today for production control of photomasks, namely SEM, AFM as well as optical microscopy and optical scatterometry is emerging, too. One of the challenges in CD metrology is to develop a syste
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c16e73e984fec4e32d647745cd812034
https://doi.org/10.1117/12.692736
https://doi.org/10.1117/12.692736
Autor:
K. R. Koops, K. Dirscherl
Publikováno v:
Nanoscale Calibration Standards and Methods: Dimensional and Related Measurements in the Micro-and Nanometer Range
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5fc7401a4544f44df9be32e979df104
https://doi.org/10.1002/3527606661.ch7
https://doi.org/10.1002/3527606661.ch7
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
S. Czerkas, C. G. Frase, K. Dirscherl, Wolfgang Häßler-Grohne, Gerd Ehret, Werner Mirande, Harald Bosse, Bernd Bodermann
Publikováno v:
SPIE Proceedings.
The PTB has developed a new 6025 photomask standard for calibration of CD metrology tools in a joint project with partners from mask industry in Germany [1]. We report on the design of the standard, its calibration procedures and the results of recen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b22bd43c47b3b89271afa6beac2d133a
https://doi.org/10.1117/12.632779
https://doi.org/10.1117/12.632779