Zobrazeno 1 - 3
of 3
pro vyhledávání: '"K A, Tarasiuk"'
Autor:
Giovanni Casini, Simone Valdré, Gabriele Pasquali, M. Teodorczyk, A. Chbihi, N. Le Neindre, Zbigniew Sosin, Mariano Vigilante, J.D. Frankland, P. Kulig, E. Bonnet, M. Guerzoni, Maurizio Bini, E. Scarlini, E. Vanzanella, Dariusz Lipiński, Bernard Borderie, A. Grzeszczuk, Z. Khabanowa, P. Edelbruck, M. Cinausero, M. Parlog, G. Spadaccini, Ł. Kordyasz, Andrea Stefanini, Alessandro Olmi, R. Bougault, K. Ga̧sior, M. Gajewski, J. Sarnecki, A.J. Kordyasz, A. Boiano, R. Alba, M.F. Rivet, D. Gruyer, M. Bruno, T. Twaróg, A. Zagojski, A. Brzozowski, G. Pastore, A. Meoli, Luca Morelli, T. Marchi, M. Kowalczyk, A. Bednarek, D. Santonocito, C. Maiolino, A. Ordine, K. Krzyżak, S. Serra, Y. Merrer, K. J. Tarasiuk, E. Vient, F. Salomon, Giacomo Poggi, H. Wodzińska, F. Gramegna, G. Tortone, W. Zipper, O. Lopez, Silvia Piantelli, Elio Rosato, Tomasz Kozik, G. Ademard, Sandro Barlini
Publikováno v:
European Physical Journal A
European Physical Journal A, EDP Sciences, 2015, 51, pp.15. ⟨10.1140/epja/i2015-15015-2⟩
European Physical Journal A, 2015, 51, pp.15. ⟨10.1140/epja/i2015-15015-2⟩
European Physical Journal A, EDP Sciences, 2015, 51, pp.15. ⟨10.1140/epja/i2015-15015-2⟩
European Physical Journal A, 2015, 51, pp.15. ⟨10.1140/epja/i2015-15015-2⟩
A new technique of large-area thin ion implanted silicon detectors has been developed within the R&D performed by the FAZIA Collaboration. The essence of the technique is the application of a low-temperature baking process instead of high-temperature
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f407ed526e31ebacfdff4695fcfe9950
http://hal.in2p3.fr/in2p3-01120218
http://hal.in2p3.fr/in2p3-01120218
Autor:
K G, Ryzhkova, K A, Tarasiuk
Publikováno v:
Vrachebnoe delo. (6)
Publikováno v:
Terapevticheskii arkhiv. 49(2)